Nonvolatile and Volatile Memory Fusion of Antiferroelectric-like Hafnium–Zirconium Oxide for Multi-Bit Access and Endurance >1012 Cycles by Alternating Polarity Cycling Recovery and Spatially Resolved Evolution

IF 8.3 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY
Cheng-Hong Liu, Kuo-Yu Hsiang, Zhi-Xian Li, Fu-Sheng Chang, Zhao-Feng Lou, Jia-Yang Lee, Chee Wee Liu, Pin Su, Tuo-Hung Hou, Min-Hung Lee
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引用次数: 0

Abstract

The fusion of volatile and nonvolatile memory within a complementary-dynamic random-access memory (C-DRAM) in one cell is proposed with antiferroelectric-like hafnium–zirconium oxide with dual function characteristics of DRAM and storage class memory in the memory hierarchy. Atomic-resolution spherical aberration-corrected scanning transmission electron microscopy is employed to directly reveal the insights of phase evolution by utilizing diffractograms to determine lattice parameters. Storage-data-transfer-cycling-recovery with an alternating access scheme is introduced due to the characteristic of independent domains to exhibit multilevel states. Remanent polarization (Pr) can be restored, and 34 periods (3 × 1010 cycles/period) to accumulate 1.02 × 1012 switching cycles are demonstrated. The proposed method is effective in prolonging the endurance and evaluating the spatially resolved evolution of polarization.

Abstract Image

利用具有 DRAM 和存储类存储器双重功能特性的反铁电类氧化铪-锆,提出了在一个单元中融合互补动态随机存取存储器(C-DRAM)中的易失性和非易失性存储器的方法。利用原子分辨率球差校正扫描透射电子显微镜,通过衍射图确定晶格参数,直接揭示了相演化的奥秘。由于独立畴呈现多级状态的特点,该研究引入了交替访问方案的存储-数据传输-循环恢复。剩余极化(Pr)可以恢复,并演示了 34 个周期(3 × 1010 个周期/周期)累计 1.02 × 1012 个开关周期。所提出的方法能有效延长续航时间并评估极化的空间分辨演化。
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来源期刊
ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
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