Direct Photopatterning of Zeolitic Imidazolate Frameworks via Photoinduced Fluorination

IF 16.9 1区 化学 Q1 CHEMISTRY, MULTIDISCIPLINARY
Xiaoli Tian, Wenjun Li, Dr. Fu Li, Mingfeng Cai, Yilong Si, Dr. Hao Tang, Dr. Haifang Li, Prof. Hao Zhang
{"title":"Direct Photopatterning of Zeolitic Imidazolate Frameworks via Photoinduced Fluorination","authors":"Xiaoli Tian,&nbsp;Wenjun Li,&nbsp;Dr. Fu Li,&nbsp;Mingfeng Cai,&nbsp;Yilong Si,&nbsp;Dr. Hao Tang,&nbsp;Dr. Haifang Li,&nbsp;Prof. Hao Zhang","doi":"10.1002/anie.202500476","DOIUrl":null,"url":null,"abstract":"<p>Precise and effective patterning strategies are essential for integrating metal–organic frameworks (MOFs) into microelectronics, photonics, sensors, and other solid-state devices. Direct lithography of MOFs with light and other irradiation sources has emerged as a promising patterning strategy. However, existing direct lithography methods often rely on the irradiation-induced amorphization of the MOFs structures and the breaking of strong covalent bonds in their organic linkers. High-energy sources (such as X-rays or electron beams) and large irradiation doses – conditions unfavorable for scalable patterning – are thus required. Here, we report a photoinduced fluorination chemistry for patterning various zeolitic imidazolate frameworks (ZIFs) under mild UV irradiation. Using UV doses as low as 10 mJ cm<sup>−2</sup>, light-sensitive fluorine-containing molecules covalently bond to ZIFs and enhance their stability in water. This creates a water-stability contrast between ZIFs in exposed and unexposed regions, enabling scalable direct photolithography of ZIFs with high resolution (2 μm) on 4-inch wafers and flexible substrates. The patterned ZIFs preserve their original crystallinity and porous properties while gaining increased hydrophobicity. This allows for the demonstration of a water-responsive fluorescent MOFs array with implications in sensing and multicolor information encryption.</p>","PeriodicalId":125,"journal":{"name":"Angewandte Chemie International Edition","volume":"64 18","pages":""},"PeriodicalIF":16.9000,"publicationDate":"2025-02-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Angewandte Chemie International Edition","FirstCategoryId":"92","ListUrlMain":"https://onlinelibrary.wiley.com/doi/10.1002/anie.202500476","RegionNum":1,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"CHEMISTRY, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0

Abstract

Precise and effective patterning strategies are essential for integrating metal–organic frameworks (MOFs) into microelectronics, photonics, sensors, and other solid-state devices. Direct lithography of MOFs with light and other irradiation sources has emerged as a promising patterning strategy. However, existing direct lithography methods often rely on the irradiation-induced amorphization of the MOFs structures and the breaking of strong covalent bonds in their organic linkers. High-energy sources (such as X-rays or electron beams) and large irradiation doses – conditions unfavorable for scalable patterning – are thus required. Here, we report a photoinduced fluorination chemistry for patterning various zeolitic imidazolate frameworks (ZIFs) under mild UV irradiation. Using UV doses as low as 10 mJ cm−2, light-sensitive fluorine-containing molecules covalently bond to ZIFs and enhance their stability in water. This creates a water-stability contrast between ZIFs in exposed and unexposed regions, enabling scalable direct photolithography of ZIFs with high resolution (2 μm) on 4-inch wafers and flexible substrates. The patterned ZIFs preserve their original crystallinity and porous properties while gaining increased hydrophobicity. This allows for the demonstration of a water-responsive fluorescent MOFs array with implications in sensing and multicolor information encryption.

Abstract Image

通过光诱导氟化直接形成咪唑酸分子筛骨架的光图像化
精确和有效的图像化策略对于将金属有机框架(mof)集成到微电子、光电子、传感器和其他固态器件中至关重要。光和其他辐照源直接光刻mof已成为一种很有前途的制版策略。然而,现有的直接光刻方法往往依赖于辐照诱导mof结构的非晶化和其有机连接体中强共价键的断裂。因此,需要高能量源(如X射线或电子束)和大照射剂量,这些条件不利于可扩展的图案。在这里,我们报告了光诱导氟化化学在轻度紫外线照射下对各种沸石咪唑盐框架(ZIFs)进行图图化。使用低至10 mJ cm-2的紫外线剂量,光敏含氟分子与zif共价结合,并增强其在水中的稳定性。这在曝光和未曝光区域的zif之间形成了水稳定性对比,使zif在4英寸晶圆和柔性基板上具有高分辨率(2 μm)的可扩展直接光刻。图案化的zif在获得更高的疏水性的同时保留了其原有的结晶度和多孔性。这允许演示具有传感和多色信息加密意义的水响应荧光mof阵列。
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来源期刊
CiteScore
26.60
自引率
6.60%
发文量
3549
审稿时长
1.5 months
期刊介绍: Angewandte Chemie, a journal of the German Chemical Society (GDCh), maintains a leading position among scholarly journals in general chemistry with an impressive Impact Factor of 16.6 (2022 Journal Citation Reports, Clarivate, 2023). Published weekly in a reader-friendly format, it features new articles almost every day. Established in 1887, Angewandte Chemie is a prominent chemistry journal, offering a dynamic blend of Review-type articles, Highlights, Communications, and Research Articles on a weekly basis, making it unique in the field.
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