Low-power 2D gate-all-around logics via epitaxial monolithic 3D integration

IF 37.2 1区 材料科学 Q1 CHEMISTRY, PHYSICAL
Junchuan Tang, Jianfeng Jiang, Xiaoyin Gao, Xin Gao, Chenxi Zhang, Mengdi Wang, Chengyuan Xue, Zhongrui Li, Yuling Yin, Congwei Tan, Feng Ding, Chenguang Qiu, Lian-Mao Peng, Hailin Peng
{"title":"Low-power 2D gate-all-around logics via epitaxial monolithic 3D integration","authors":"Junchuan Tang, Jianfeng Jiang, Xiaoyin Gao, Xin Gao, Chenxi Zhang, Mengdi Wang, Chengyuan Xue, Zhongrui Li, Yuling Yin, Congwei Tan, Feng Ding, Chenguang Qiu, Lian-Mao Peng, Hailin Peng","doi":"10.1038/s41563-025-02117-w","DOIUrl":null,"url":null,"abstract":"Innovations in device architectures and materials promote transistor miniaturization for improved performance, energy efficiency and integration density. At foreseeable ångström nodes, a gate-all-around (GAA) field-effect transistor based on two-dimensional (2D) semiconductors would provide excellent electrostatic gate controllability to achieve ultimate power scaling and performance delivering. However, a major roadblock lies in the scalable integration of 2D GAA heterostructures with atomically smooth and conformal interfaces. Here we report a wafer-scale multi-layer-stacked single-crystalline 2D GAA configuration achieved with low-temperature monolithic three-dimensional integration, in which high-mobility 2D semiconductor Bi2O2Se was epitaxially integrated by high-κ layered native-oxide dielectric Bi2SeO5 with an atomically smooth interface, enabling a high electron mobility of 280 cm2 V−1 s−1 and a near-ideal subthreshold swing of 62 mV dec−1. The scaled 2D GAA field-effect transistor with 30 nm gate length exhibits an ultralow operation voltage of 0.5 V, a high on-state current exceeding 1 mA μm−1, an ultralow intrinsic delay of 1.9 ps and an energy-delay product of 1.84 × 10−27 Js μm−1. This work demonstrates a wafer-scale 2D-material-based GAA system with valid performance and power merits, holding promising prospects for beyond-silicon monolithic three-dimensional circuits. A multi-layer wafer-scale 2D gate-all-around system with an atomically smooth interface fabricated via epitaxial monolithic 3D integration shows good performance and power efficiency, holding promise for the forthcoming ångström technology node.","PeriodicalId":19058,"journal":{"name":"Nature Materials","volume":"24 4","pages":"519-526"},"PeriodicalIF":37.2000,"publicationDate":"2025-02-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Nature Materials","FirstCategoryId":"88","ListUrlMain":"https://www.nature.com/articles/s41563-025-02117-w","RegionNum":1,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"CHEMISTRY, PHYSICAL","Score":null,"Total":0}
引用次数: 0

Abstract

Innovations in device architectures and materials promote transistor miniaturization for improved performance, energy efficiency and integration density. At foreseeable ångström nodes, a gate-all-around (GAA) field-effect transistor based on two-dimensional (2D) semiconductors would provide excellent electrostatic gate controllability to achieve ultimate power scaling and performance delivering. However, a major roadblock lies in the scalable integration of 2D GAA heterostructures with atomically smooth and conformal interfaces. Here we report a wafer-scale multi-layer-stacked single-crystalline 2D GAA configuration achieved with low-temperature monolithic three-dimensional integration, in which high-mobility 2D semiconductor Bi2O2Se was epitaxially integrated by high-κ layered native-oxide dielectric Bi2SeO5 with an atomically smooth interface, enabling a high electron mobility of 280 cm2 V−1 s−1 and a near-ideal subthreshold swing of 62 mV dec−1. The scaled 2D GAA field-effect transistor with 30 nm gate length exhibits an ultralow operation voltage of 0.5 V, a high on-state current exceeding 1 mA μm−1, an ultralow intrinsic delay of 1.9 ps and an energy-delay product of 1.84 × 10−27 Js μm−1. This work demonstrates a wafer-scale 2D-material-based GAA system with valid performance and power merits, holding promising prospects for beyond-silicon monolithic three-dimensional circuits. A multi-layer wafer-scale 2D gate-all-around system with an atomically smooth interface fabricated via epitaxial monolithic 3D integration shows good performance and power efficiency, holding promise for the forthcoming ångström technology node.

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来源期刊
Nature Materials
Nature Materials 工程技术-材料科学:综合
CiteScore
62.20
自引率
0.70%
发文量
221
审稿时长
3.2 months
期刊介绍: Nature Materials is a monthly multi-disciplinary journal aimed at bringing together cutting-edge research across the entire spectrum of materials science and engineering. It covers all applied and fundamental aspects of the synthesis/processing, structure/composition, properties, and performance of materials. The journal recognizes that materials research has an increasing impact on classical disciplines such as physics, chemistry, and biology. Additionally, Nature Materials provides a forum for the development of a common identity among materials scientists and encourages interdisciplinary collaboration. It takes an integrated and balanced approach to all areas of materials research, fostering the exchange of ideas between scientists involved in different disciplines. Nature Materials is an invaluable resource for scientists in academia and industry who are active in discovering and developing materials and materials-related concepts. It offers engaging and informative papers of exceptional significance and quality, with the aim of influencing the development of society in the future.
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