Effects of Insertion Depth and Modiolar Proximity on Cochlear Implant Speech Recognition Outcomes With a Precurved Electrode Array.

IF 1.9 3区 医学 Q3 CLINICAL NEUROLOGY
Otology & Neurotology Pub Date : 2025-03-01 Epub Date: 2024-12-30 DOI:10.1097/MAO.0000000000004405
Michael W Canfarotta, Margaret T Dillon, Nicholas J Thompson, A Morgan Selleck, Matthew M Dedmon, Kevin D Brown
{"title":"Effects of Insertion Depth and Modiolar Proximity on Cochlear Implant Speech Recognition Outcomes With a Precurved Electrode Array.","authors":"Michael W Canfarotta, Margaret T Dillon, Nicholas J Thompson, A Morgan Selleck, Matthew M Dedmon, Kevin D Brown","doi":"10.1097/MAO.0000000000004405","DOIUrl":null,"url":null,"abstract":"<p><strong>Objectives: </strong>To examine the relationship between angular insertion depth (AID), modiolar proximity, and speech recognition outcomes for cochlear implant (CI) recipients of a precurved electrode array.</p><p><strong>Study design: </strong>Retrospective review.</p><p><strong>Setting: </strong>Tertiary academic referral center.</p><p><strong>Patients: </strong>Thirty-five adult CI recipients (n = 40 ears) of precurved electrode arrays listening with a CI-alone device.</p><p><strong>Interventions: </strong>Cochlear implantation with postoperative computed tomography.</p><p><strong>Main outcome measures: </strong>Consonant-nucleus-consonant (CNC) word recognition at 6 months post-activation.</p><p><strong>Results: </strong>A multivariate regression model demonstrated that both deeper apical AID and closer modiolar proximity in the basal turn were independently associated with better CNC word scores at 6 months (F2,37 = 7.264, p = 0.002). A deeper basal insertion depth was positively correlated with apical AID (r = 0.754, p < 0.001) but negatively correlated with modiolar proximity in the basal turn (r = -0.766, p < 0.001).</p><p><strong>Conclusions: </strong>These data suggest that both apical cochlear coverage and modiolar proximity independently confer speech recognition benefit with a precurved array. However, these benefits are mutually exclusive for current precurved array designs as a deeper basal insertion depth results in greater apical coverage but lateralization of electrodes away from the modiolus in the basal turn. Future work is needed to elucidate mechanisms behind these findings that may motivate electrode array design modifications to further optimize outcomes for CI users.</p>","PeriodicalId":19732,"journal":{"name":"Otology & Neurotology","volume":"46 3","pages":"272-278"},"PeriodicalIF":1.9000,"publicationDate":"2025-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Otology & Neurotology","FirstCategoryId":"3","ListUrlMain":"https://doi.org/10.1097/MAO.0000000000004405","RegionNum":3,"RegionCategory":"医学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"2024/12/30 0:00:00","PubModel":"Epub","JCR":"Q3","JCRName":"CLINICAL NEUROLOGY","Score":null,"Total":0}
引用次数: 0

Abstract

Objectives: To examine the relationship between angular insertion depth (AID), modiolar proximity, and speech recognition outcomes for cochlear implant (CI) recipients of a precurved electrode array.

Study design: Retrospective review.

Setting: Tertiary academic referral center.

Patients: Thirty-five adult CI recipients (n = 40 ears) of precurved electrode arrays listening with a CI-alone device.

Interventions: Cochlear implantation with postoperative computed tomography.

Main outcome measures: Consonant-nucleus-consonant (CNC) word recognition at 6 months post-activation.

Results: A multivariate regression model demonstrated that both deeper apical AID and closer modiolar proximity in the basal turn were independently associated with better CNC word scores at 6 months (F2,37 = 7.264, p = 0.002). A deeper basal insertion depth was positively correlated with apical AID (r = 0.754, p < 0.001) but negatively correlated with modiolar proximity in the basal turn (r = -0.766, p < 0.001).

Conclusions: These data suggest that both apical cochlear coverage and modiolar proximity independently confer speech recognition benefit with a precurved array. However, these benefits are mutually exclusive for current precurved array designs as a deeper basal insertion depth results in greater apical coverage but lateralization of electrodes away from the modiolus in the basal turn. Future work is needed to elucidate mechanisms behind these findings that may motivate electrode array design modifications to further optimize outcomes for CI users.

预弯曲电极阵列对人工耳蜗语音识别效果的影响。
目的:研究预弯曲电极阵列植入人工耳蜗(CI)受者的角插入深度(AID)、模摩尔接近度和语音识别结果之间的关系。研究设计:回顾性研究。单位:三级学术转诊中心。患者:35例成人CI受者(n = 40耳),采用预弯曲电极阵列聆听单独CI装置。干预措施:人工耳蜗植入术后计算机断层扫描。主要结果测量:激活后6个月的辅音-核-辅音(CNC)单词识别。结果:一个多变量回归模型显示,在6个月时,更深的根尖AID和更近的基侧磨牙距离与更好的CNC单词评分独立相关(F2,37 = 7.264, p = 0.002)。基底插入深度越深与根尖AID呈正相关(r = 0.754, p < 0.001),而与基底转模磨牙接近度呈负相关(r = -0.766, p < 0.001)。结论:这些数据表明,尖端耳蜗覆盖和臼齿接近都独立地赋予了预弯曲阵列语音识别的优势。然而,对于目前的预弯曲阵列设计来说,这些好处是相互排斥的,因为更深的基底插入深度会导致更大的根尖覆盖,但在基底转弯时电极会偏离molmolus。未来的工作需要阐明这些发现背后的机制,这些发现可能会激发电极阵列设计的修改,以进一步优化CI用户的结果。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
Otology & Neurotology
Otology & Neurotology 医学-耳鼻喉科学
CiteScore
3.80
自引率
14.30%
发文量
509
审稿时长
3-6 weeks
期刊介绍: ​​​​​Otology & Neurotology publishes original articles relating to both clinical and basic science aspects of otology, neurotology, and cranial base surgery. As the foremost journal in its field, it has become the favored place for publishing the best of new science relating to the human ear and its diseases. The broadly international character of its contributing authors, editorial board, and readership provides the Journal its decidedly global perspective.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信