Exploring ionised metal flux fraction in magnetron sputtering: Insights from laboratory and industrial applications

IF 5.3 2区材料科学 Q1 MATERIALS SCIENCE, COATINGS & FILMS

Surface & Coatings Technology Pub Date : 2025-02-06 DOI:10.1016/j.surfcoat.2025.131866

Peter Klein , Jaroslav Hnilica , Vjačeslav Sochora , Petr Vašina

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引用次数: 0

Abstract

Magnetron sputtering is one of the cornerstones of thin film-forming methods. The literature provides excessive knowledge about inner plasma processes, deposition control and thin film growth, but the overwhelming majority reports on results conducted on a small lab scale. To transfer this knowledge and use it in industrial applications, one has to overcome many challenges, the most profound being scaling the process from the lab scale towards a large industrial scale. This paper explores the critical differences in deposition fluxes and ionisation of metals when scaling from lab to industrial systems. While in the laboratory, the direct current magnetron sputtering does not create sufficient metal ions, this is dramatically different in the industrial system, where up to 30% of the film-forming species detected were ions. Additionally, the deposition rate in the industrial system was about one order of magnitude higher compared to the laboratory system.

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来源期刊

Surface & Coatings Technology 工程技术-材料科学：膜

CiteScore

10.00

自引率

11.10%

发文量

921

审稿时长

19 days

期刊介绍： Surface and Coatings Technology is an international archival journal publishing scientific papers on significant developments in surface and interface engineering to modify and improve the surface properties of materials for protection in demanding contact conditions or aggressive environments, or for enhanced functional performance. Contributions range from original scientific articles concerned with fundamental and applied aspects of research or direct applications of metallic, inorganic, organic and composite coatings, to invited reviews of current technology in specific areas. Papers submitted to this journal are expected to be in line with the following aspects in processes, and properties/performance: A. Processes: Physical and chemical vapour deposition techniques, thermal and plasma spraying, surface modification by directed energy techniques such as ion, electron and laser beams, thermo-chemical treatment, wet chemical and electrochemical processes such as plating, sol-gel coating, anodization, plasma electrolytic oxidation, etc., but excluding painting. B. Properties/performance: friction performance, wear resistance (e.g., abrasion, erosion, fretting, etc), corrosion and oxidation resistance, thermal protection, diffusion resistance, hydrophilicity/hydrophobicity, and properties relevant to smart materials behaviour and enhanced multifunctional performance for environmental, energy and medical applications, but excluding device aspects.