Development of a Deep Ultraviolet Positive-Tone Photoresist from the Sustainable Building Block Cyrene

IF 7 2区材料科学 Q2 CHEMISTRY, PHYSICAL

Chemistry of Materials Pub Date : 2025-01-28 DOI:10.1021/acs.chemmater.4c0281310.1021/acs.chemmater.4c02813

Yizhou Liu, Josua Markus, Han-Hao Cheng, Paul V. Bernhardt, Andrew K. Whittaker, Idriss Blakey* and Craig M. Williams*,

引用次数: 0

Abstract

The advancements in micro- and nanofabrication of semiconductor devices have led to a growing demand for innovative molecules to enhance photolithographic imaging materials. However, intensified production demands placed on deep ultraviolet (DUV) positive-tone chemically amplified resists, especially those based on polymethacrylates with alicyclic pendant groups, face increasing environmental challenges (e.g., nonsustainable monomer feedstocks). Disclosed herein is the synthesis of a series of methacrylic monomers and homopolymers derived from derivatives of the sustainable chemical building block dihydrolevoglucosenone (Cyrene, DLGO), obtained from renewable cellulose feedstocks. Poly(n-BuMDLGO) showed photoacid lability that modified the solubility upon treatment with basic developing solutions. This feature enabled photopatterning using both DUV (contact mask) and electron beam lithography.

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用可持续材料昔兰尼制备深紫外正色调光刻胶

半导体器件的微纳米制造的进步导致了对创新分子的需求不断增长，以增强光刻成像材料。然而，对深紫外（DUV）正调化学放大抗蚀剂的强化生产需求，特别是那些基于具有脂环基团的聚甲基丙烯酸酯的抗蚀剂，面临着越来越多的环境挑战（例如，不可持续的单体原料）。本发明公开了一系列甲基丙烯酸单体和均聚物的合成，这些均聚物来源于可再生纤维素原料中获得的可持续化学构建块二氢左旋葡萄糖酮（Cyrene， DLGO）的衍生物。聚（n- bummdlgo）表现出光酸不稳定性，这改变了碱性显影液处理后的溶解度。这一特性使得使用DUV（接触掩模）和电子束光刻进行光刻成为可能。

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来源期刊

Chemistry of Materials 工程技术-材料科学：综合

CiteScore

14.10

自引率

5.80%

发文量

929

审稿时长

1.5 months

期刊介绍： The journal Chemistry of Materials focuses on publishing original research at the intersection of materials science and chemistry. The studies published in the journal involve chemistry as a prominent component and explore topics such as the design, synthesis, characterization, processing, understanding, and application of functional or potentially functional materials. The journal covers various areas of interest, including inorganic and organic solid-state chemistry, nanomaterials, biomaterials, thin films and polymers, and composite/hybrid materials. The journal particularly seeks papers that highlight the creation or development of innovative materials with novel optical, electrical, magnetic, catalytic, or mechanical properties. It is essential that manuscripts on these topics have a primary focus on the chemistry of materials and represent a significant advancement compared to prior research. Before external reviews are sought, submitted manuscripts undergo a review process by a minimum of two editors to ensure their appropriateness for the journal and the presence of sufficient evidence of a significant advance that will be of broad interest to the materials chemistry community.