Enhanced surface transport properties of high-quality ultrathin epitaxial Bi2Te3 films

IF 3.5 3区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY
Jian Gao, Xudong Shi, Tingting Li, Zhiyu Wang, Mingze Li, Xuan P. A. Gao, Zhenhua Wang, Zhidong Zhang
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Abstract

The topological surface states (TSS) of 3D topological insulators (TI) play a crucial role in their transport. How to avoid intrinsic defects in materials and thus increase the proportion of surface states in the transport process poses a great challenge to materials scientists. In our work, high-quality epitaxial topological insulator Bi2Te3 ultrathin films with flat surface were prepared by pulsed laser deposition (PLD). The insulating resistivity-temperature (ρ-T) curve in Bi2(TexSe1-x)3 films with optimal doping concentration (25–35%) shows the transport of bulk state caused by intrinsic defects which is gradually suppressed. In thinner Bi2Te3 films, the ρ-T curve displays a transition from negative to positive slope at higher temperatures, which is attributed to enhanced electron–electron interaction (EEI). The transition from a parabolic to a linear to a weak anti-localization (WAL) was observed in the magnetoresistance (MR) results of pure Bi2Te3 ultrathin films with different thicknesses. By comparing the MR of Bi2(TexSe1-x)3 films with different Se doping concentrations, it is found that the MR of the Se-doped films and the WAL near the zero magnetic field are obvious, and the change is greatest at the optimal doping concentration. The magnetoconductivity (MC) data ΔG can be fitted well by the quantum interference model Hikami, Larkin, and Nagaoka (HLN) equation at magnetic fields as high as ± 7 T. This provides guidance for further research on how to enhance the TSS transport of 3D TIs.

Graphical Abstract

高质量超薄外延Bi2Te3薄膜表面输运性能的增强
三维拓扑绝缘子的拓扑表面态(TSS)在其输运过程中起着至关重要的作用。如何避免材料的固有缺陷,从而增加表面态在输运过程中的比例,是材料科学家面临的巨大挑战。采用脉冲激光沉积(PLD)法制备了高质量的平面外延拓扑绝缘体Bi2Te3超薄薄膜。当掺杂浓度为25 ~ 35%时,Bi2(TexSe1-x)3薄膜的绝缘电阻率-温度(ρ-T)曲线显示出由本征缺陷引起的体态输运逐渐被抑制。在较薄的Bi2Te3薄膜中,ρ-T曲线在较高温度下由负斜率转变为正斜率,这归因于电子-电子相互作用(EEI)的增强。在不同厚度纯Bi2Te3超薄膜的磁阻(MR)结果中观察到从抛物线到线性到弱反局域化(WAL)的转变。通过比较不同Se掺杂浓度Bi2(TexSe1-x)3膜的MR,发现Se掺杂膜的MR和零磁场附近的WAL都很明显,且在最佳掺杂浓度时变化最大。在高达±7 t的磁场下,量子干涉模型Hikami, Larkin, and Nagaoka (HLN)方程可以很好地拟合磁导率(MC)数据ΔG,这为进一步研究如何增强3D ti的TSS输运提供了指导。图形抽象
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来源期刊
Journal of Materials Science
Journal of Materials Science 工程技术-材料科学:综合
CiteScore
7.90
自引率
4.40%
发文量
1297
审稿时长
2.4 months
期刊介绍: The Journal of Materials Science publishes reviews, full-length papers, and short Communications recording original research results on, or techniques for studying the relationship between structure, properties, and uses of materials. The subjects are seen from international and interdisciplinary perspectives covering areas including metals, ceramics, glasses, polymers, electrical materials, composite materials, fibers, nanostructured materials, nanocomposites, and biological and biomedical materials. The Journal of Materials Science is now firmly established as the leading source of primary communication for scientists investigating the structure and properties of all engineering materials.
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