High dynamic wavefront stability control for high-uniformity periodic microstructure fabrication

IF 3.5 2区 工程技术 Q2 ENGINEERING, MANUFACTURING
Zijian Zhong , Jingwen Li , Tianshi Lu , Xinghui Li
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引用次数: 0

Abstract

Periodic microstructures are widely used in optical communication, sensing, and imaging systems for their superior performance in optical modulation. Among their fabrication methods, interference lithography stands out for its high precision and uniformity, making it applicable for the fabrication of large-area periodic microstructures. However, the exposure wavefront is subject to the environmental perturbations, and the resulted drifts compromise the quality of produced photoresist mask. To address this problem, a method for exposure wavefront control aimed at high-uniformity periodic microstructures fabricating is proposed. Embedded in a dual-beam interference lithography system, the method monitors the drifts based on high-speed CCD image acquisition of the Moiré pattern generated by a reference grating, computes the magnitude of drifts based on a line-sampling cross-correlation algorithm and compensates for the drifts based on mirrors driven by piezoelectric actuators. The proposed method achieves simultaneous monitoring and controlling of phase and period drifts at a bandwidth of over 250 Hz. Experiments demonstrate that this system can effectively suppress low-frequency disturbances-induced drifts and reduce the root mean square (RMS) value of phase drifts to 9×103 grating periods and period drifts to 2.27×105 grating periods during exposure, providing a solid foundation for fabricating high-uniformity periodic microstructures.
高均匀性周期微结构制造的高动态波前稳定性控制
周期微结构以其优越的光调制性能在光通信、传感和成像系统中得到了广泛的应用。在这些制造方法中,干涉光刻以其高精度和均匀性突出,适用于制造大面积周期微结构。然而,暴露波前受环境扰动的影响,产生的漂移会影响光刻胶掩膜的质量。针对这一问题,提出了一种针对高均匀性周期微结构加工的暴露波前控制方法。该方法嵌入到双光束干涉光刻系统中,利用高速CCD采集参考光栅产生的波纹图来监测漂移,利用行采样互相关算法计算漂移的大小,并利用压电驱动器驱动的反射镜对漂移进行补偿。该方法在带宽大于250hz的情况下实现了相位漂移和周期漂移的同步监测和控制。实验表明,该系统能有效抑制低频扰动引起的漂移,在曝光过程中相位漂移的均方根值(RMS)降至9×10−3个光栅周期,周期漂移降至2.27×10−5个光栅周期,为制作高均匀性的周期微结构提供了坚实的基础。
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来源期刊
CiteScore
7.40
自引率
5.60%
发文量
177
审稿时长
46 days
期刊介绍: Precision Engineering - Journal of the International Societies for Precision Engineering and Nanotechnology is devoted to the multidisciplinary study and practice of high accuracy engineering, metrology, and manufacturing. The journal takes an integrated approach to all subjects related to research, design, manufacture, performance validation, and application of high precision machines, instruments, and components, including fundamental and applied research and development in manufacturing processes, fabrication technology, and advanced measurement science. The scope includes precision-engineered systems and supporting metrology over the full range of length scales, from atom-based nanotechnology and advanced lithographic technology to large-scale systems, including optical and radio telescopes and macrometrology.
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