Nicolas Martin , Eliot Martin , Jean-Marc Cote , Fabrice Sthal , Joseph Gavoille , Marina Raschetti , Stefania Oliveri
{"title":"Low temperature dependence of resistivity in obliquely sputter-deposited gold thin films","authors":"Nicolas Martin , Eliot Martin , Jean-Marc Cote , Fabrice Sthal , Joseph Gavoille , Marina Raschetti , Stefania Oliveri","doi":"10.1016/j.surfcoat.2025.131884","DOIUrl":null,"url":null,"abstract":"<div><div>We report on the electrical resistivity at low temperature of Au thin films 400 nm thick deposited by DC magnetron sputtering using oblique angle deposition (OAD). The deposition angle <em>α</em> is gradually and systematically changed from 0° to 80°. A tilted and voided columnar structure is produced for deposition angles higher than 60°, whereas the lowest angles lead to a dense and compact structure with no clear cross-section morphology. Resistivity <em>vs.</em> temperature measurements reveal a typical metallic-like behavior in the range 7–300 K whatever the deposition angle. The latter gives rise to a significant increase of residual resistivity and temperature coefficient of resistance, and again for the most grazing angles, <em>i.e.</em>, α > 60°. The Bloch-Grüneisen model is assumed for understanding the evolution of electron-phonon interactions as a function of the deposition angle. This enhanced resistivity is connected to the structural defects and the porous architecture especially emphasized for glancing angles, and the strengthening of the electron-phonon coupling for high deposition angles.</div></div>","PeriodicalId":22009,"journal":{"name":"Surface & Coatings Technology","volume":"499 ","pages":"Article 131884"},"PeriodicalIF":5.3000,"publicationDate":"2025-02-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Surface & Coatings Technology","FirstCategoryId":"88","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0257897225001586","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"MATERIALS SCIENCE, COATINGS & FILMS","Score":null,"Total":0}
引用次数: 0
Abstract
We report on the electrical resistivity at low temperature of Au thin films 400 nm thick deposited by DC magnetron sputtering using oblique angle deposition (OAD). The deposition angle α is gradually and systematically changed from 0° to 80°. A tilted and voided columnar structure is produced for deposition angles higher than 60°, whereas the lowest angles lead to a dense and compact structure with no clear cross-section morphology. Resistivity vs. temperature measurements reveal a typical metallic-like behavior in the range 7–300 K whatever the deposition angle. The latter gives rise to a significant increase of residual resistivity and temperature coefficient of resistance, and again for the most grazing angles, i.e., α > 60°. The Bloch-Grüneisen model is assumed for understanding the evolution of electron-phonon interactions as a function of the deposition angle. This enhanced resistivity is connected to the structural defects and the porous architecture especially emphasized for glancing angles, and the strengthening of the electron-phonon coupling for high deposition angles.
期刊介绍:
Surface and Coatings Technology is an international archival journal publishing scientific papers on significant developments in surface and interface engineering to modify and improve the surface properties of materials for protection in demanding contact conditions or aggressive environments, or for enhanced functional performance. Contributions range from original scientific articles concerned with fundamental and applied aspects of research or direct applications of metallic, inorganic, organic and composite coatings, to invited reviews of current technology in specific areas. Papers submitted to this journal are expected to be in line with the following aspects in processes, and properties/performance:
A. Processes: Physical and chemical vapour deposition techniques, thermal and plasma spraying, surface modification by directed energy techniques such as ion, electron and laser beams, thermo-chemical treatment, wet chemical and electrochemical processes such as plating, sol-gel coating, anodization, plasma electrolytic oxidation, etc., but excluding painting.
B. Properties/performance: friction performance, wear resistance (e.g., abrasion, erosion, fretting, etc), corrosion and oxidation resistance, thermal protection, diffusion resistance, hydrophilicity/hydrophobicity, and properties relevant to smart materials behaviour and enhanced multifunctional performance for environmental, energy and medical applications, but excluding device aspects.