Influence of annealing temperature on the photocatalytic efficiency of sol-gel dip-coated ZnO thin films in methyl orange degradation

IF 2.9 Q1 MATERIALS SCIENCE, CERAMICS

Open Ceramics Pub Date : 2024-12-13 DOI:10.1016/j.oceram.2024.100727

A.H. Haritha , M.E. Cruz , O. Sisman , A. Duran , D. Galusek , J.J. Velázquez , Y. Castro

{"title":"Influence of annealing temperature on the photocatalytic efficiency of sol-gel dip-coated ZnO thin films in methyl orange degradation","authors":"A.H. Haritha , M.E. Cruz , O. Sisman , A. Duran , D. Galusek , J.J. Velázquez , Y. Castro","doi":"10.1016/j.oceram.2024.100727","DOIUrl":null,"url":null,"abstract":"<div><div>ZnO thin films on glass substrates and silicon wafers were prepared by the sol-gel dipcoating technique and annealed at temperatures ranging from 300 - 550 °C. X-ray diffraction (XRD) and Raman analysis confirm the hexagonal wurtzite structure of ZnO. Scanning electron microscopy (SEM) examination confirmed that the films were homogeneous, crack-free and with a uniform distribution of nano-sized spherical grains. The decomposition of methyl orange (MO) using a solar simulator was used to determine the photocatalytic activity of the thin films. The annealing temperature was found to have a significant influence on the structure, morphology, and photocatalytic performance of ZnO thin films. The best photocatalytic activity under solar irradiation was shown by the ZnO thin film annealed at 450 °C. The enhanced photocatalytic performance of the films can be attributed to their optimized crystallinity, surface roughness and morphology, which provide more active sites for the photocatalytic reactions.</div></div>","PeriodicalId":34140,"journal":{"name":"Open Ceramics","volume":"21 ","pages":"Article 100727"},"PeriodicalIF":2.9000,"publicationDate":"2024-12-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Open Ceramics","FirstCategoryId":"1085","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S2666539524001913","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"MATERIALS SCIENCE, CERAMICS","Score":null,"Total":0}

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Abstract

ZnO thin films on glass substrates and silicon wafers were prepared by the sol-gel dipcoating technique and annealed at temperatures ranging from 300 - 550 °C. X-ray diffraction (XRD) and Raman analysis confirm the hexagonal wurtzite structure of ZnO. Scanning electron microscopy (SEM) examination confirmed that the films were homogeneous, crack-free and with a uniform distribution of nano-sized spherical grains. The decomposition of methyl orange (MO) using a solar simulator was used to determine the photocatalytic activity of the thin films. The annealing temperature was found to have a significant influence on the structure, morphology, and photocatalytic performance of ZnO thin films. The best photocatalytic activity under solar irradiation was shown by the ZnO thin film annealed at 450 °C. The enhanced photocatalytic performance of the films can be attributed to their optimized crystallinity, surface roughness and morphology, which provide more active sites for the photocatalytic reactions.

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