SO2 sensing performance of silicon substitutional doped (8,0) carbon nanotube: A density functional theory study

IF 4.1 Q1 CHEMISTRY, ANALYTICAL
Poonam Parkar , Ajay Chaudhari , Mahadev Rangnath Sonawane , Balasaheb Jijaba Nagare
{"title":"SO2 sensing performance of silicon substitutional doped (8,0) carbon nanotube: A density functional theory study","authors":"Poonam Parkar ,&nbsp;Ajay Chaudhari ,&nbsp;Mahadev Rangnath Sonawane ,&nbsp;Balasaheb Jijaba Nagare","doi":"10.1016/j.talo.2025.100403","DOIUrl":null,"url":null,"abstract":"<div><div>This work explores the reactivity of sulfur dioxide (SO₂) when adsorbed onto silicon (Si) substitutional doped (8,0) carbon nanotube (Si-CNT) by examining the influence of Si doping on SO₂ adsorption behaviour. Silicon doping maintains the semiconducting nature of pristine carbon nanotubes, with a slight reduction in the band gap from 0.61 eV to 0.54 eV. Moreover, the minimum energy path for SO₂ adsorption on Si-CNTs reveals a chemisorptive process, with an adsorption energy of -1.66 eV, signifying an exothermic reaction where the binding energy of the product exceeds that of the reactants. Molecular orbital analysis supports these findings, showing that the lowest unoccupied molecular orbital (LUMO) is localized on the Si-CNT, while the highest occupied molecular orbital (HOMO) is predominantly located on the SO₂ molecule. Fukui function calculations further show that silicon atom plays a pivotal role by donating electrons to both, the adjacent carbon atoms and the SO₂ molecule. This electron donation leads to a notable accumulation of negative charge on the SO₂ molecule, confirming charge transfer from the Si-CNTs to SO₂. This partial ionic character in the bonding enhances the sensitivity of p-type Si-CNTs to SO₂ molecule.</div></div>","PeriodicalId":436,"journal":{"name":"Talanta Open","volume":"11 ","pages":"Article 100403"},"PeriodicalIF":4.1000,"publicationDate":"2025-01-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Talanta Open","FirstCategoryId":"1085","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S2666831925000062","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"CHEMISTRY, ANALYTICAL","Score":null,"Total":0}
引用次数: 0

Abstract

This work explores the reactivity of sulfur dioxide (SO₂) when adsorbed onto silicon (Si) substitutional doped (8,0) carbon nanotube (Si-CNT) by examining the influence of Si doping on SO₂ adsorption behaviour. Silicon doping maintains the semiconducting nature of pristine carbon nanotubes, with a slight reduction in the band gap from 0.61 eV to 0.54 eV. Moreover, the minimum energy path for SO₂ adsorption on Si-CNTs reveals a chemisorptive process, with an adsorption energy of -1.66 eV, signifying an exothermic reaction where the binding energy of the product exceeds that of the reactants. Molecular orbital analysis supports these findings, showing that the lowest unoccupied molecular orbital (LUMO) is localized on the Si-CNT, while the highest occupied molecular orbital (HOMO) is predominantly located on the SO₂ molecule. Fukui function calculations further show that silicon atom plays a pivotal role by donating electrons to both, the adjacent carbon atoms and the SO₂ molecule. This electron donation leads to a notable accumulation of negative charge on the SO₂ molecule, confirming charge transfer from the Si-CNTs to SO₂. This partial ionic character in the bonding enhances the sensitivity of p-type Si-CNTs to SO₂ molecule.
求助全文
约1分钟内获得全文 求助全文
来源期刊
Talanta Open
Talanta Open Chemistry-Analytical Chemistry
CiteScore
5.20
自引率
0.00%
发文量
86
审稿时长
49 days
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信