The enhancement of the infrared switching efficiency and laser protection performance of VO2 film with Ta gradient doping

IF 3.8 2区材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY

Vacuum Pub Date : 2024-12-25 DOI:10.1016/j.vacuum.2024.113984

Leran Zhao , Wei Ou , Junbai Ma , Huijuan Zhu , Min Feng , Juncheng Liu

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Abstract

A low phase transition threshold (T_c) and high infrared switching efficiency (r) are essential for the practical application of VO₂ film in laser protection field. A Ta gradient-doped VO₂ film with low T_c and high r was fabricated successfully. The effect of the gradient doping method on the phase transition performance of VO₂ film was investigated. The film's T_c decreases to 34.6 °C as the Ta uniform doping concentration increases, but its r also decreases to 45.1 %. Fortunately, the gradient doping can restore the r, increasing it from 45.1 % to 56.2 %, while maintaining a low T_c of 37.2 °C. The total density of state and the band structure of the Ta doped VO₂ film were calculated with the first principles, and the action mechanism of the gradient doping to optimize the phase transition performance was investigated. The overall laser protection performance of the Ta gradient-doped film was superior to that of the uniform-doped film and the pure VO₂ film. Both an IMT quality factor and a laser protection quality factor were proposed for the comprehensive evaluation of the VO₂ film's phase transition performance.

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来源期刊

Vacuum 工程技术-材料科学：综合

CiteScore

6.80

自引率

17.50%

发文量

审稿时长

34 days

期刊介绍： Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.