{"title":"Destruction of surface oxide on (100)W in high-temperature atomic carbon deposition","authors":"E.V. Rut'kov, E.Y. Afanas'eva, N.R. Gall","doi":"10.1016/j.susc.2024.122689","DOIUrl":null,"url":null,"abstract":"<div><div>Sequential adsorption of oxygen and carbon on the (100)W surface was studied in a wide temperature range at <em>T</em> = 900–2100 K. Surface tungsten oxide WO is formed upon oxygen adsorption at <em>T</em> = 300 K. Carbon deposition with atomic flux on surface oxide at <em>T</em> = 900–1100 K results in the replacement of the surface oxide by surface tungsten carbide, and this process requires a double carbon dose compared to that required to create the surface carbide on the atomically clean tungsten surface. Oxygen leaves the surface, apparently, due to the formation of CO molecules, which thermally desorb at this temperature, and carry away not only oxygen, but also half of the deposited carbon. The oxygen-free adsorption centers are simultaneously filled with newly arriving carbon atoms, which build the surface carbide WC.</div></div>","PeriodicalId":22100,"journal":{"name":"Surface Science","volume":"754 ","pages":"Article 122689"},"PeriodicalIF":2.1000,"publicationDate":"2024-12-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Surface Science","FirstCategoryId":"92","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0039602824002401","RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"CHEMISTRY, PHYSICAL","Score":null,"Total":0}
引用次数: 0
Abstract
Sequential adsorption of oxygen and carbon on the (100)W surface was studied in a wide temperature range at T = 900–2100 K. Surface tungsten oxide WO is formed upon oxygen adsorption at T = 300 K. Carbon deposition with atomic flux on surface oxide at T = 900–1100 K results in the replacement of the surface oxide by surface tungsten carbide, and this process requires a double carbon dose compared to that required to create the surface carbide on the atomically clean tungsten surface. Oxygen leaves the surface, apparently, due to the formation of CO molecules, which thermally desorb at this temperature, and carry away not only oxygen, but also half of the deposited carbon. The oxygen-free adsorption centers are simultaneously filled with newly arriving carbon atoms, which build the surface carbide WC.
期刊介绍:
Surface Science is devoted to elucidating the fundamental aspects of chemistry and physics occurring at a wide range of surfaces and interfaces and to disseminating this knowledge fast. The journal welcomes a broad spectrum of topics, including but not limited to:
• model systems (e.g. in Ultra High Vacuum) under well-controlled reactive conditions
• nanoscale science and engineering, including manipulation of matter at the atomic/molecular scale and assembly phenomena
• reactivity of surfaces as related to various applied areas including heterogeneous catalysis, chemistry at electrified interfaces, and semiconductors functionalization
• phenomena at interfaces relevant to energy storage and conversion, and fuels production and utilization
• surface reactivity for environmental protection and pollution remediation
• interactions at surfaces of soft matter, including polymers and biomaterials.
Both experimental and theoretical work, including modeling, is within the scope of the journal. Work published in Surface Science reaches a wide readership, from chemistry and physics to biology and materials science and engineering, providing an excellent forum for cross-fertilization of ideas and broad dissemination of scientific discoveries.