Novel sulfonylimide photo-acid generators for deep ultraviolet photoresist with improved acid diffusion inhibition performance through retarding the anion diffusion

IF 4.1 3区化学 Q2 CHEMISTRY, PHYSICAL

Journal of Photochemistry and Photobiology A-chemistry Pub Date : 2025-01-20 DOI:10.1016/j.jphotochem.2025.116279

Guangju Liu , Na Li , Xiang Gao

引用次数: 0

Abstract

A series of novel ionic photo-acid generators (PAGs) useful in chemically amplified photoresist formulations has been developed, which are salts comprising a photoactive triphenyl cation and a sulfonylimide anion containing an aromatic group. A styrene-based polymer resin is prepared by reversible addition-fragmentation chain transfer (RAFT) polymerization and blended with the novel PAGs as deep ultraviolet (DUV) photoresists. Furthermore, one of the novel PAGs is used as a monomer to be bound into the polymer resin through RAFT polymerization to obtain a photoresist-PAG copolymer. The prepared photoresists are exposed by a DUV light to study their sensitivity, acid diffusion length, and lithography pattern profile. The results show that both the photoresists blended with the novel PAGs and the photoresist-PAG copolymer exhibit good resistance to acid diffusion and low line sidewall roughness (LSR).

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来源期刊

Journal of Photochemistry and Photobiology A-chemistry 化学-物理化学

CiteScore

7.90

自引率

7.00%

发文量

580

审稿时长

48 days

期刊介绍： JPPA publishes the results of fundamental studies on all aspects of chemical phenomena induced by interactions between light and molecules/matter of all kinds. All systems capable of being described at the molecular or integrated multimolecular level are appropriate for the journal. This includes all molecular chemical species as well as biomolecular, supramolecular, polymer and other macromolecular systems, as well as solid state photochemistry. In addition, the journal publishes studies of semiconductor and other photoactive organic and inorganic materials, photocatalysis (organic, inorganic, supramolecular and superconductor). The scope includes condensed and gas phase photochemistry, as well as synchrotron radiation chemistry. A broad range of processes and techniques in photochemistry are covered such as light induced energy, electron and proton transfer; nonlinear photochemical behavior; mechanistic investigation of photochemical reactions and identification of the products of photochemical reactions; quantum yield determinations and measurements of rate constants for primary and secondary photochemical processes; steady-state and time-resolved emission, ultrafast spectroscopic methods, single molecule spectroscopy, time resolved X-ray diffraction, luminescence microscopy, and scattering spectroscopy applied to photochemistry. Papers in emerging and applied areas such as luminescent sensors, electroluminescence, solar energy conversion, atmospheric photochemistry, environmental remediation, and related photocatalytic chemistry are also welcome.

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