Fast carbidization of silicon in additive manufactured Si-C-SiC composite

Tsovinar Ghaltaghchyan , Khachik Nazaretyan , Viktorya Rstakyan , Marina Aghayan
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Abstract

Silicon carbide-based composites are advantageous material for electronic industry. Their application is limited by the difficulty to fabricate complex structural parts. This research used powder bed additive manufacturing technology, particularly selective laser melting, to manufacture silicon carbide-based composite. However, during the laser sintering silicon carbide decomposed to silicon and carbon. Further carbidization of free silicon faces the challenge of silicon carbide (SiC) formation, which can prevent further reaction between the reacting elements.
To enhance the carbidization process we heated the samples with ultra-high heating rates (2000 °C/min) employing High-Speed Temperature Scanning (HSTS) technique using direct electrical current to heat the sample. Formation of silicon carbide takes place, achieving higher density of the samples. We have compared the results with the samples heated at relatively lower heating rates (100 °C/min). The mechanism of interaction was explained.
The heating rate has critical effect on silicon carbide formation, impacting the atomic diffusion rate between silicon and carbon, final microstructure and density of the samples. The silicon carbidization process can be achieved by direct heating the samples at ultra-high heating rates.
添加剂制备的硅- c - sic复合材料中硅的快速渗碳
碳化硅基复合材料是电子工业的有利材料。它们的应用受到制造复杂结构件的困难的限制。本研究采用粉末床增材制造技术,特别是选择性激光熔化技术,制备碳化硅基复合材料。但在激光烧结过程中,碳化硅分解为硅和碳。自由硅的进一步碳化面临碳化硅(SiC)形成的挑战,这可以阻止反应元素之间的进一步反应。为了加强渗碳过程,我们采用高速温度扫描(HSTS)技术,利用直流电加热样品,以超高加热速率(2000°C/min)加热样品。碳化硅的形成,使样品的密度更高。我们将结果与在相对较低的加热速率(100°C/min)下加热的样品进行了比较。解释了相互作用的机理。升温速率对碳化硅的形成有重要影响,影响了硅与碳之间的原子扩散速率、样品的最终微观结构和密度。硅渗碳过程可以通过以超高升温速率直接加热样品实现。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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CiteScore
5.30
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0.00%
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