{"title":"High L10-Ordering and Flat Surface Introducing a Two-Step Heating Process with Frank–Van der Merwe Initial Growth Mode at Low Temperature","authors":"Samuel Vergara, and , Hiroshi Naganuma*, ","doi":"10.1021/acs.cgd.4c0154910.1021/acs.cgd.4c01549","DOIUrl":null,"url":null,"abstract":"<p >FePd films were epitaxially grown on SrTiO<sub>3</sub> (001) substrates by rf magnetron sputtering. The preferred crystal orientation of FePd was (111)<sub>fcc</sub> when the substrate temperature (<i>T</i><sub>s</sub>) was room temperature during film deposition. Above <i>T</i><sub>s</sub> = 150 °C, the main preferred orientation of FePd changed from (111) to (001). Above <i>T</i><sub>s</sub> = 400 °C, the degree of <i>L</i>1<sub>0</sub> ordering (S<sub>L10</sub>) of FePd increased monotonically and reached 0.88 at <i>T</i><sub>s</sub> = 600 °C. Below <i>T</i><sub>s</sub> = 350 °C, a flat surface was formed, which might be considered Frank–Van der Merwe’s (FM) mode growth. Above <i>T</i><sub>s</sub> = 400 °C, the surface roughness (<i>R</i><sub>a</sub>) increased and reached <i>R</i><sub>a</sub> of 3.9 nm at <i>T</i><sub>s</sub> = 600 °C. We call this as a ‘<i>one-step heating process</i>’. The high S<sub>L10</sub> and flat surface were not simultaneously obtained by the one-step heating process. We introduced the ’<i>two-step heating method</i>’ to obtain high S<sub>L10</sub> and flat surface simultaneously: the films were grown at low <i>T</i><sub>s</sub>, followed by postannealing at <i>T</i><sub>a</sub> = 600 °C. This two-step heating method realized a high S<sub>L10</sub> of 0.98 (considering the Pd excess composition) and a flat surface (<i>R</i><sub>a</sub> = 0.3 nm) by <i>T</i><sub>s</sub> = 150 °C followed by <i>T</i><sub>a</sub> = 600 °C. By the two-step heating, the S<sub>L10</sub> increased from 0.88 to 0.98, and the flatness improved from 3.9 to 0.3 nm. The flat surface is thought to be due to FM growth mode because FePd film was deposited at low <i>T</i><sub>s</sub> such as 150 °C, and once a flat surface was formed at low <i>T</i><sub>s</sub>, the flat surface was maintained even after <i>T</i><sub>a</sub> = 600 °C. For the reason for the high degree of <i>L</i>1<sub>0</sub> ordering at a flat surface, we consider that the flat surface reducing the atoms on the slope caused by coarse grains result in promoting <i>L</i>1<sub>0</sub> ordering. <i>K</i><sub>u</sub> was 1.04 MJ/m<sup>3</sup> at 300 K (1.20 MJ/m<sup>3</sup> at 10 K), and the high perpendicular magnetic anisotropy (PMA) resulted in a small temperature dependence of <i>K</i><sub>u</sub> and <i>M</i><sub>s</sub>. It is expected that the PMA can be increased to a theoretical value (2 MJ/m<sup>3</sup>) by removing the twin-like dislocations observed in the cross-sectional transmission electron microscope images.</p>","PeriodicalId":34,"journal":{"name":"Crystal Growth & Design","volume":"25 3","pages":"768–776 768–776"},"PeriodicalIF":3.2000,"publicationDate":"2025-01-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Crystal Growth & Design","FirstCategoryId":"92","ListUrlMain":"https://pubs.acs.org/doi/10.1021/acs.cgd.4c01549","RegionNum":2,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"CHEMISTRY, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0
Abstract
FePd films were epitaxially grown on SrTiO3 (001) substrates by rf magnetron sputtering. The preferred crystal orientation of FePd was (111)fcc when the substrate temperature (Ts) was room temperature during film deposition. Above Ts = 150 °C, the main preferred orientation of FePd changed from (111) to (001). Above Ts = 400 °C, the degree of L10 ordering (SL10) of FePd increased monotonically and reached 0.88 at Ts = 600 °C. Below Ts = 350 °C, a flat surface was formed, which might be considered Frank–Van der Merwe’s (FM) mode growth. Above Ts = 400 °C, the surface roughness (Ra) increased and reached Ra of 3.9 nm at Ts = 600 °C. We call this as a ‘one-step heating process’. The high SL10 and flat surface were not simultaneously obtained by the one-step heating process. We introduced the ’two-step heating method’ to obtain high SL10 and flat surface simultaneously: the films were grown at low Ts, followed by postannealing at Ta = 600 °C. This two-step heating method realized a high SL10 of 0.98 (considering the Pd excess composition) and a flat surface (Ra = 0.3 nm) by Ts = 150 °C followed by Ta = 600 °C. By the two-step heating, the SL10 increased from 0.88 to 0.98, and the flatness improved from 3.9 to 0.3 nm. The flat surface is thought to be due to FM growth mode because FePd film was deposited at low Ts such as 150 °C, and once a flat surface was formed at low Ts, the flat surface was maintained even after Ta = 600 °C. For the reason for the high degree of L10 ordering at a flat surface, we consider that the flat surface reducing the atoms on the slope caused by coarse grains result in promoting L10 ordering. Ku was 1.04 MJ/m3 at 300 K (1.20 MJ/m3 at 10 K), and the high perpendicular magnetic anisotropy (PMA) resulted in a small temperature dependence of Ku and Ms. It is expected that the PMA can be increased to a theoretical value (2 MJ/m3) by removing the twin-like dislocations observed in the cross-sectional transmission electron microscope images.
期刊介绍:
The aim of Crystal Growth & Design is to stimulate crossfertilization of knowledge among scientists and engineers working in the fields of crystal growth, crystal engineering, and the industrial application of crystalline materials.
Crystal Growth & Design publishes theoretical and experimental studies of the physical, chemical, and biological phenomena and processes related to the design, growth, and application of crystalline materials. Synergistic approaches originating from different disciplines and technologies and integrating the fields of crystal growth, crystal engineering, intermolecular interactions, and industrial application are encouraged.