Takashi Hamada, Tetsuya Sugimoto, Arata Tanaka, Tetsuya Maeda, Daiji Katsura, Hiroyuki Koga and Joji Ohshita
{"title":"Quaternary ammonium-functionalized polysilsesquioxanes for antifogging coating†","authors":"Takashi Hamada, Tetsuya Sugimoto, Arata Tanaka, Tetsuya Maeda, Daiji Katsura, Hiroyuki Koga and Joji Ohshita","doi":"10.1039/D4LP00322E","DOIUrl":null,"url":null,"abstract":"<p >Aiming to develop antifogging materials with enhanced antifogging properties and scratch resistance, polysilsesquioxane films containing quaternary ammonium groups were prepared <em>via</em> a sol–gel reaction and quaternization. Owing to their high water uptake, scratch hardness, and transparency, the prepared quaternary ammonium-functionalized polysilsesquioxane films are promising for application in antifogging coatings.</p>","PeriodicalId":101139,"journal":{"name":"RSC Applied Polymers","volume":" 1","pages":" 92-96"},"PeriodicalIF":0.0000,"publicationDate":"2024-11-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://pubs.rsc.org/en/content/articlepdf/2025/lp/d4lp00322e?page=search","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"RSC Applied Polymers","FirstCategoryId":"1085","ListUrlMain":"https://pubs.rsc.org/en/content/articlelanding/2025/lp/d4lp00322e","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Aiming to develop antifogging materials with enhanced antifogging properties and scratch resistance, polysilsesquioxane films containing quaternary ammonium groups were prepared via a sol–gel reaction and quaternization. Owing to their high water uptake, scratch hardness, and transparency, the prepared quaternary ammonium-functionalized polysilsesquioxane films are promising for application in antifogging coatings.
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