High-Speed Planar InGaAs/InAlAs Avalanche Photodiode

IF 2.3 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC
Shuai Wang;Han Ye;Liyan Geng;Yimiao Chu;Yu Zheng;Qin Han
{"title":"High-Speed Planar InGaAs/InAlAs Avalanche Photodiode","authors":"Shuai Wang;Han Ye;Liyan Geng;Yimiao Chu;Yu Zheng;Qin Han","doi":"10.1109/LPT.2025.3534294","DOIUrl":null,"url":null,"abstract":"This letter describes a planar avalanche photodiode (APD) with 3dB bandwidth of 40 GHz at gain of 2.5, which is the highest bandwidth among reported vertical planar InAlAs APD. The APD adopts selective Zn diffusion to form the planar structure. Scale of the APD can be easily reduced to meet the needs of high-speed operation. The added p/n double charge layers can accurately adjust the electric field distribution inside the APD. By optimizing the thickness of the absorption and the transit layers, a compromise can be determined between carrier transport time and capacitance to achieve high bandwidth. An equivalent circuit of planar APD was established, laying the foundation for characteristics performance optimization. The fabricated APD uses 90 nm InAlAs as the multiplication layer and the dark current is <inline-formula> <tex-math>$1~{\\mu } $ </tex-math></inline-formula>A. The responsivity of the top-incidence APD without anti-reflection is 0.15 A/W at <inline-formula> <tex-math>$1.55~{\\mu } $ </tex-math></inline-formula>m. The gain reaches 45 when the incident light intensity is <inline-formula> <tex-math>$10~{\\mu } $ </tex-math></inline-formula>W.","PeriodicalId":13065,"journal":{"name":"IEEE Photonics Technology Letters","volume":"37 4","pages":"235-238"},"PeriodicalIF":2.3000,"publicationDate":"2025-01-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Photonics Technology Letters","FirstCategoryId":"5","ListUrlMain":"https://ieeexplore.ieee.org/document/10854528/","RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0

Abstract

This letter describes a planar avalanche photodiode (APD) with 3dB bandwidth of 40 GHz at gain of 2.5, which is the highest bandwidth among reported vertical planar InAlAs APD. The APD adopts selective Zn diffusion to form the planar structure. Scale of the APD can be easily reduced to meet the needs of high-speed operation. The added p/n double charge layers can accurately adjust the electric field distribution inside the APD. By optimizing the thickness of the absorption and the transit layers, a compromise can be determined between carrier transport time and capacitance to achieve high bandwidth. An equivalent circuit of planar APD was established, laying the foundation for characteristics performance optimization. The fabricated APD uses 90 nm InAlAs as the multiplication layer and the dark current is $1~{\mu } $ A. The responsivity of the top-incidence APD without anti-reflection is 0.15 A/W at $1.55~{\mu } $ m. The gain reaches 45 when the incident light intensity is $10~{\mu } $ W.
高速平面InGaAs/InAlAs雪崩光电二极管
这封信描述了一个平面雪崩光电二极管(APD),其3dB带宽为40 GHz,增益为2.5,是目前报道的垂直平面InAlAs APD中带宽最高的。APD采用Zn选择性扩散形成平面结构。APD的规模可以很容易地缩小,以满足高速运行的需要。添加的p/n双电荷层可以精确调节APD内部的电场分布。通过优化吸收层和传输层的厚度,可以确定载流子传输时间和电容之间的折衷,以实现高带宽。建立了平面APD等效电路,为其特性性能优化奠定了基础。制备的APD采用90 nm InAlAs作为倍增层,暗电流为1~{\mu} $ A,在1.55~{\mu} $ m入射光强为10~{\mu} $ W时,无增透的顶入射APD的响应度为0.15 A/W,增益为45。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
IEEE Photonics Technology Letters
IEEE Photonics Technology Letters 工程技术-工程:电子与电气
CiteScore
5.00
自引率
3.80%
发文量
404
审稿时长
2.0 months
期刊介绍: IEEE Photonics Technology Letters addresses all aspects of the IEEE Photonics Society Constitutional Field of Interest with emphasis on photonic/lightwave components and applications, laser physics and systems and laser/electro-optics technology. Examples of subject areas for the above areas of concentration are integrated optic and optoelectronic devices, high-power laser arrays (e.g. diode, CO2), free electron lasers, solid, state lasers, laser materials'' interactions and femtosecond laser techniques. The letters journal publishes engineering, applied physics and physics oriented papers. Emphasis is on rapid publication of timely manuscripts. A goal is to provide a focal point of quality engineering-oriented papers in the electro-optics field not found in other rapid-publication journals.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信