TUNA-EBSD-CL correlative multi-microscopy study, on the example of Cu(In,Ga)S2 solar cell absorber

IF 1.5 4区 工程技术 Q3 MICROSCOPY
Yucheng Hu, Gunnar Kusch, Damilola Adeleye, Susanne Siebentritt, Rachel Oliver
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Abstract

Multi-microscopy offers significant benefits to the understanding of complex materials behaviour by providing complementary information from different properties. However, some characterisations may strongly influence other measurements in the same workflow. To acquire reliable and valid datasets, optimising multi-microscopy procedure is necessary. In present work, we studied the influence of the measurement order on the quality of multi-microscopy datasets. Multi-microscopy incorporating tunnelling current AFM (TUNA), electron backscatter diffraction (EBSD), and cathodoluminescence (CL) on a polycrystalline solar cell absorber, Cu(In,Ga)S2 (CIGS), is used as an example. The investigation revealed potential characterisation-induced contaminations, such as surface oxidation and hydrocarbon layer coating, of the sample surface. Their subsequent influence on the measurement results of following correlation techniques was examined. To optimise the dataset quality, multi-microscopy should be carried out in TUNA-EBSD-CL order, from the most to the least surface sensitive techniques. With the optimised multi-microscopy measurement order on a CIGS absorber, we directly correlated the local changes in electrical and opto-electronic properties with the microstructure of grain boundaries (GBs). The described methodology may also provide insightful concepts for applying other AFM-SEM-based multi-microscopy on different semiconductor materials.

Abstract Image

以Cu(In,Ga)S2太阳能电池吸收体为例,TUNA-EBSD-CL相关多显微研究。
多显微镜通过提供来自不同性质的补充信息,为理解复杂材料的行为提供了显著的好处。然而,某些特征可能强烈地影响同一工作流中的其他度量。为了获得可靠和有效的数据集,优化多显微镜程序是必要的。在本工作中,我们研究了测量顺序对多显微数据集质量的影响。以多晶太阳能电池吸收剂Cu(In,Ga)S2 (CIGS)为例,采用隧道电流AFM (TUNA)、电子背散射衍射(EBSD)和阴极发光(CL)的多晶显微镜技术进行了研究。调查结果显示,样品表面存在潜在的表征性污染,如表面氧化和碳氢化合物层涂层。研究了它们对后续相关技术测量结果的后续影响。为了优化数据集质量,应按照TUNA-EBSD-CL顺序,从表面灵敏度最高到表面灵敏度最低的顺序进行多显微检查。通过优化的CIGS吸收器上的多显微镜测量顺序,我们直接将电学和光电性质的局部变化与晶界(GBs)的微观结构联系起来。所描述的方法也可以提供有见地的概念,应用其他afm - sem为基础的多显微镜对不同的半导体材料。
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来源期刊
Journal of microscopy
Journal of microscopy 工程技术-显微镜技术
CiteScore
4.30
自引率
5.00%
发文量
83
审稿时长
1 months
期刊介绍: The Journal of Microscopy is the oldest journal dedicated to the science of microscopy and the only peer-reviewed publication of the Royal Microscopical Society. It publishes papers that report on the very latest developments in microscopy such as advances in microscopy techniques or novel areas of application. The Journal does not seek to publish routine applications of microscopy or specimen preparation even though the submission may otherwise have a high scientific merit. The scope covers research in the physical and biological sciences and covers imaging methods using light, electrons, X-rays and other radiations as well as atomic force and near field techniques. Interdisciplinary research is welcome. Papers pertaining to microscopy are also welcomed on optical theory, spectroscopy, novel specimen preparation and manipulation methods and image recording, processing and analysis including dynamic analysis of living specimens. Publication types include full papers, hot topic fast tracked communications and review articles. Authors considering submitting a review article should contact the editorial office first.
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