Ana Conde-Rubio, Juan R Deop-Ruano, Luis Cerdán, Alejandro Manjavacas, Agustín Mihi
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引用次数: 0
Abstract
High-refractive-index (HRI) dielectrics are gaining increasing attention as building blocks for compact lasers. Their ability to simultaneously support both electric and magnetic modes provides greater versatility as compared to plasmonic platforms. Moreover, their reduced absorption loss minimizes heat generation, further enhancing their performance. Here, we employ a scalable soft nanoimprinting lithography method to create a series of two-dimensional (2D) periodic square hole arrays in polymeric films (SU-8), which are coated with an HRI dielectric layer (TiO2). These structures exhibit low-threshold lasing from an organic dye-doped SU-8 layer deposited on top. We study arrays with different lattice parameters and a sample with a random distribution of holes, finding that the optimal laser performance occurs when the optical resonances of the array align with the emission wavelength range of the dye. Furthermore, we observe that the anisotropy in the TiO2 coating breaks the polarization degeneracy of the square arrays, leading to the emergence of new modes and enabling the simultaneous appearance of multiple lasing peaks. Our work shows that, despite the simplicity of their fabrication process, the HRI structures studied here exhibit a high degree of complexity, leading to a rich optical response and enabling multiband lasing. This offers an innovative approach to building robust HRI platforms for lasing with improved control over their emission properties.
期刊介绍:
Nanoscale Horizons stands out as a premier journal for publishing exceptionally high-quality and innovative nanoscience and nanotechnology. The emphasis lies on original research that introduces a new concept or a novel perspective (a conceptual advance), prioritizing this over reporting technological improvements. Nevertheless, outstanding articles showcasing truly groundbreaking developments, including record-breaking performance, may also find a place in the journal. Published work must be of substantial general interest to our broad and diverse readership across the nanoscience and nanotechnology community.