Fabrication and characterization of heteroepitaxial Zn2GeO4 films on sapphire via radio frequency magnetron sputtering

IF 3.6 2区物理与天体物理 Q2 PHYSICS, APPLIED

Applied Physics Letters Pub Date : 2025-01-21 DOI:10.1063/5.0244857

Kai Niu, Xueting Du, Wei Mi, Di Wang, Lin'an He, Liwei Zhou, Yan Zhu, Juan Wang, Xingcheng Zhang, Jinshi Zhao

引用次数: 0

Abstract

In this study, we explored the fabrication, structural characteristics, and optical properties of Zn2GeO4 thin films grown on c-cut Al2O3 substrates via radio frequency magnetron sputtering. The crystalline quality, surface morphology, and optical characteristics were comprehensively evaluated at various annealing temperatures, and the 700 °C-annealed film presented the best crystallization quality. XRD and TEM results revealed the microstructure of Zn2GeO4 film and confirmed that the epitaxial relationship is Zn2GeO4 (0006)//Al2O3 (0006) with Zn2GeO4 [11¯00]//Al2O3 [11¯00]. O 1s spectrum indicated the bandgap of the 700 °C-annealed film is 4.98 eV. UV-Vis-Near Infrared spectroscopy showed that the average transmittance reached approximately 85% in the visible region, and the optical bandgap of Zn2GeO4 film annealed at 700 °C was about 5.02 eV.

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射频磁控溅射制备蓝宝石异质外延Zn2GeO4薄膜及表征

在这项研究中，我们探索了用射频磁控溅射在c-cut Al2O3衬底上生长Zn2GeO4薄膜的制备、结构特征和光学性能。在不同退火温度下，对薄膜的结晶质量、表面形貌和光学特性进行了综合评价，700℃退火薄膜的结晶质量最好。XRD和TEM结果揭示了Zn2GeO4薄膜的微观结构，证实了Zn2GeO4 (0006)//Al2O3（0006）与Zn2GeO4[11¯00]//Al2O3[11¯00]的外延关系。o1s谱显示，700℃退火膜的带隙为4.98 eV。紫外-可见-近红外光谱分析表明，Zn2GeO4薄膜在可见光区的平均透过率约为85%，700℃退火后的光学带隙约为5.02 eV。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Applied Physics Letters 物理-物理：应用

CiteScore

6.40

自引率

10.00%

发文量

1821

审稿时长

1.6 months

期刊介绍： Applied Physics Letters (APL) features concise, up-to-date reports on significant new findings in applied physics. Emphasizing rapid dissemination of key data and new physical insights, APL offers prompt publication of new experimental and theoretical papers reporting applications of physics phenomena to all branches of science, engineering, and modern technology. In addition to regular articles, the journal also publishes invited Fast Track, Perspectives, and in-depth Editorials which report on cutting-edge areas in applied physics. APL Perspectives are forward-looking invited letters which highlight recent developments or discoveries. Emphasis is placed on very recent developments, potentially disruptive technologies, open questions and possible solutions. They also include a mini-roadmap detailing where the community should direct efforts in order for the phenomena to be viable for application and the challenges associated with meeting that performance threshold. Perspectives are characterized by personal viewpoints and opinions of recognized experts in the field. Fast Track articles are invited original research articles that report results that are particularly novel and important or provide a significant advancement in an emerging field. Because of the urgency and scientific importance of the work, the peer review process is accelerated. If, during the review process, it becomes apparent that the paper does not meet the Fast Track criterion, it is returned to a normal track.