Formation of Diamond-Like Carbon Films by the Plasma-Chemical Decomposition of Hydrocarbons

Abstract

The process of the formation of diamond-like carbon films on the surface of monocrystalline silicon is studied. The film is formed as a result of the plasma-chemical decomposition of hydrocarbons (propane, butane) and subsequent annealing in a vacuum. The carbon film is formed in the form of diamond-like nanoparticles with a diameter of about 8 nm. Silicon–carbon bonds are formed at the boundary of the silicon substrate and the carbon film, which ensures strong adhesion.