Triazenide based metal precursors for vapour deposition

IF 3.5 3区 化学 Q2 CHEMISTRY, INORGANIC & NUCLEAR
Nathan J. O'Brien and Henrik Pedersen
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引用次数: 0

Abstract

Molecules featuring a metal centre in a positive valence surrounded by 1,3-dialkyltrianzenide ligands, Mx+[R–NN–N–R′]x, were shown to have both high thermal stability and volatility, making them interesting as precursors in chemical vapour deposition (CVD) and atomic layer deposition (ALD). So far, metals from groups 11–14 and lanthanoids form stable triazenides and the In and Ga triazenides have proven to be excellent precursors for InN, In2O3, GaN and InGaN. We believe the exploration of the triazenides as CVD and ALD precursors has only begun and hope to inspire further research with this perspective.

Abstract Image

气相沉积用三氮杂化物基金属前体
以金属中心为正价的分子被1,3-二烷基三氮化物配体Mx+(R-N = N-N-R ')x所包围,具有很高的热稳定性和挥发性,使它们成为化学气相沉积(CVD)和原子层沉积(ALD)的前体。到目前为止,来自11-14基团的金属和类镧形成稳定的三氮化化合物,而In和Ga三氮化化合物已被证明是InN, In2O3, GaN和InGaN的优秀前体。我们相信,对三氮烯类化合物作为CVD和ALD前体的探索才刚刚开始,并希望从这一角度激发进一步的研究。
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来源期刊
Dalton Transactions
Dalton Transactions 化学-无机化学与核化学
CiteScore
6.60
自引率
7.50%
发文量
1832
审稿时长
1.5 months
期刊介绍: Dalton Transactions is a journal for all areas of inorganic chemistry, which encompasses the organometallic, bioinorganic and materials chemistry of the elements, with applications including synthesis, catalysis, energy conversion/storage, electrical devices and medicine. Dalton Transactions welcomes high-quality, original submissions in all of these areas and more, where the advancement of knowledge in inorganic chemistry is significant.
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