Electronic and magnetic properties of GeP monolayer modulated by Ge vacancies and doping with Mn and Fe transition metals

IF 3.9 3区 化学 Q2 CHEMISTRY, MULTIDISCIPLINARY
RSC Advances Pub Date : 2025-01-13 DOI:10.1039/D4RA05770H
Hoang Van Ngoc, Vo Van On, Huynh Thi Phuong Thuy, J. Guerrero-Sanchez and D. M. Hoat
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Abstract

In this work, Ge vacancies and doping with transition metals (Mn and Fe) are proposed to modulate the electronic and magnetic properties of GeP monolayers. A pristine GeP monolayer is a non-magnetic two-dimensional (2D) material, exhibiting indirect gap semiconductor behavior with an energy gap of 1.34(2.04) eV obtained from PBE(HSE06)-based calculations. Single Ge vacancy (VaGe) and pair Ge vacancies (pVaGe) magnetize the monolayer significantly with total magnetic moments of 2.00 and 2.02 μB, respectively. Herein, P atoms around the defect sites are the main contributors to the system magnetism. Similarly, the monolayer magnetization is induced by doping with Mn (MnGe) and Fe (FeGe) atoms. In these cases, total magnetic moments of 3.00 and 4.00 μB are obtained, respectively, and the system magnetism originates mainly from transition metal impurities. The calculated band structures assert the diluted magnetic semiconductor nature of VaGe and FeGe systems, while pVaGe and MnGe systems can be classified as 2D half-metallic materials. Further, the spin orientation in Mn- and Fe-doped GeP monolayers is studied. Results indicate the antiferromagnetic state in the case of doping with pair transition metal atoms. Regardless of the interatomic distance between dopant atoms, Mn-doped systems exhibit ferromagnetic half-metallicity, where the parallel spin orientation is energetically more favorable than the antiparallel configuration. In contrast, the antiparallel spin orientation is stable in Fe-doped systems, which show the antiferromagnetic semiconductor nature. Results presented herein may introduce new prospective 2D spintronic materials made from non-magnetic GeP monolayers.

Abstract Image

锗空位和掺杂Mn和Fe过渡金属调制的GeP单层的电子和磁性能
在这项工作中,提出了Ge空位和掺杂过渡金属(Mn和Fe)来调节GeP单层的电子和磁性能。原始GeP单层是一种非磁性二维(2D)材料,表现出间接间隙半导体行为,基于PBE(HSE06)计算得出的能量间隙为1.34(2.04)eV。单锗空位(VaGe)和对锗空位(pVaGe)对单层膜的磁化作用显著,总磁矩分别为2.00和2.02 μB。其中,缺陷位点周围的P原子是系统磁性的主要贡献者。同样,单层磁化是由Mn (MnGe)和Fe (FeGe)原子掺杂引起的。在这种情况下,得到的总磁矩分别为3.00 μB和4.00 μB,系统磁性主要来源于过渡金属杂质。计算得到的能带结构证实了VaGe和FeGe体系的稀释磁性半导体性质,而pVaGe和MnGe体系可以归类为二维半金属材料。进一步研究了Mn和fe掺杂GeP单层膜的自旋取向。结果表明,在掺杂对过渡金属原子的情况下存在反铁磁态。无论掺杂原子之间的原子间距离如何,mn掺杂体系都表现出铁磁半金属性,其中平行自旋取向在能量上比反平行构型更有利。相反,在掺铁体系中,反平行自旋取向是稳定的,显示出反铁磁性的半导体性质。本文的研究结果可能为非磁性GeP单层制备新的二维自旋电子材料提供了新的前景。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
RSC Advances
RSC Advances chemical sciences-
CiteScore
7.50
自引率
2.60%
发文量
3116
审稿时长
1.6 months
期刊介绍: An international, peer-reviewed journal covering all of the chemical sciences, including multidisciplinary and emerging areas. RSC Advances is a gold open access journal allowing researchers free access to research articles, and offering an affordable open access publishing option for authors around the world.
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