Enhanced photo-Fenton degradation of tetracycline using MIL-101(Fe)/g-C3N4/FeOCl double Z-scheme heterojunction catalyst

IF 6.9 2区材料科学 Q2 CHEMISTRY, PHYSICAL

Applied Surface Science Pub Date : 2025-01-11 DOI:10.1016/j.apsusc.2025.162386

Qingsong Yu , Zhuo Zhao , Zhiqiang Wei , Meijie Ding , Zhiming Li , Junen Jia , Meipan Zhou , Lihua Yuan , Jinglong Bai , Huining Zhang

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Abstract

In this study, a novel photo-Fenton catalyst MIL-101(Fe)/g-C₃N₄/FeOCl with double Z-type heterostructure was successfully prepared. The photo-Fenton experimental results demonstrated that, under simulated sunlight irradiation, the catalyst efficiently removed 97.4 % of tetracycline (TC) within 60 min, achieving a removal rate 5.5 times higher than that of single FeOCl. It was observed that an internal electric field directed towards FeOCl was formed at the MIL-101(Fe)/g-C₃N₄/FeOCl interface, which promoted the directional migration of photogenerated carriers and effectively inhibited their recombination. Additionally, the dual Z-scheme heterostructure photo-Fenton catalyst exhibited good cyclic stability and environmental adaptability. Based on density functional theory calculations and radical trapping experiments, a reasonable mechanism for the degradation of tetracycline by this catalyst was proposed. This study provides a new insight into the design of Z-type heterojunctions with multi-channel charge transfer and the removal of antibiotics from water.

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MIL-101(Fe)/g-C3N4/FeOCl双Z-scheme异质结催化剂增强四环素的光- fenton降解

本研究成功制备了具有双z型异质结构的新型光fenton催化剂MIL-101(Fe)/g-C3N4/FeOCl。光- fenton实验结果表明，在模拟阳光照射下，该催化剂在60 min内高效脱除了97.4% %的四环素（TC），脱除率是单一FeOCl的5.5倍。观察到MIL-101(Fe)/g-C3N4/FeOCl界面处形成了一个指向FeOCl的内部电场，促进了光生载流子的定向迁移，有效抑制了它们的复合。此外，双z型异质结构光- fenton催化剂具有良好的循环稳定性和环境适应性。通过密度泛函理论计算和自由基捕获实验，提出了该催化剂降解四环素的合理机理。该研究为设计具有多通道电荷转移的z型异质结和去除水中抗生素提供了新的见解。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Applied Surface Science 工程技术-材料科学：膜

CiteScore

12.50

自引率

7.50%

发文量

3393

审稿时长

67 days

期刊介绍： Applied Surface Science covers topics contributing to a better understanding of surfaces, interfaces, nanostructures and their applications. The journal is concerned with scientific research on the atomic and molecular level of material properties determined with specific surface analytical techniques and/or computational methods, as well as the processing of such structures.