The Effect of Fe and Co doping on the Physical Properties of CdO Films Deposited by Ultrasonic Spray Pyrolysis

IF 2.8 4区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC
Barbaros Demirselcuk, İbrahim Güneş, Emrah Sarıca, Esra Kuş, Ayşe Küçükarslan, Vildan Bilgin
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Abstract

In this study, Cadmium Oxide (CdO) semiconductor films with different iron (Fe) and cobalt (Co) concentrations have been produced at 350 °C substrate temperature on the glass substrates by the ultrasonic spray pyrolysis method. In the first part of this study, the Fe element was doped in different ratios (2, 4, 6%) to CdO films, and the films were characterized. At the end of this stage, the optimum Fe doping ratio was determined for CdO films. In the second step, CdO films were dually doped with Fe + Co. The electrical resistivities of CdO:Fe films were determined using a four-probe technique to measure their conductivities, carrier concentrations, mobilities, and electrical conductivity types through Hall measurements. The produced films showed n-type electrical conductivity. It was determined that with increasing doping ratios, the electrical resistivity generally increased, and the films exhibited n-type conductivity. The XRD patterns revealed that the crystal structures of the films were polycrystalline and cubic in structure. The lections of (111), (200), (220), (311), and (222) planes were observed in the XRD patterns. Upon examination of the SEM images, it was observed that the films had nearly homogeneous surfaces and good adhesion to the substrate. By utilizing the fundamental absorption spectra of the films, it was determined that they exhibited direct bandgap transitions, and the bandgap energy values ranged from 2.34 to 2.65 eV. In the structural analysis, all films were found to have a polycrystalline structure and cubic CdO crystal system. When the SEM images of CdO:(Fe + Co) films were examined, it was observed that the films had almost homogeneous surfaces. Based on all these analyses, it was concluded that the doping elements Fe and Co significantly influenced the physical properties of CdO thin films.

Fe和Co掺杂对超声喷雾热解沉积CdO薄膜物理性能的影响
本研究采用超声喷雾热解法,在350℃的衬底温度下,在玻璃衬底上制备了不同铁(Fe)和钴(Co)浓度的氧化镉(CdO)半导体薄膜。在本研究的第一部分中,将Fe元素以不同比例(2,4,6 %)掺杂到CdO薄膜中,并对薄膜进行表征。在这一阶段的最后,确定了最佳的Fe掺杂比例。第二步,在CdO薄膜中掺杂Fe + Co。采用四探针技术测定了CdO:Fe薄膜的电阻率,通过霍尔测量测量了其电导率、载流子浓度、迁移率和电导率类型。制备的薄膜具有n型导电性。结果表明,随着掺杂比的增加,薄膜的电阻率普遍增大,薄膜呈现n型电导率。XRD分析表明,薄膜的晶体结构为多晶和立方结构。在XRD图谱中观察到(111)、(200)、(220)、(311)和(222)平面的选择性。通过对扫描电镜图像的检查,可以观察到薄膜具有几乎均匀的表面,并且与衬底具有良好的附着力。利用薄膜的基本吸收光谱,确定薄膜具有直接的带隙跃迁,带隙能值在2.34 ~ 2.65 eV之间。在结构分析中,发现所有薄膜都具有多晶结构和立方CdO晶体体系。对CdO:(Fe + Co)薄膜的SEM图像进行了分析,发现其表面基本均匀。综上所述,Fe和Co元素的掺杂对CdO薄膜的物理性能有显著影响。
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来源期刊
Journal of Materials Science: Materials in Electronics
Journal of Materials Science: Materials in Electronics 工程技术-材料科学:综合
CiteScore
5.00
自引率
7.10%
发文量
1931
审稿时长
2 months
期刊介绍: The Journal of Materials Science: Materials in Electronics is an established refereed companion to the Journal of Materials Science. It publishes papers on materials and their applications in modern electronics, covering the ground between fundamental science, such as semiconductor physics, and work concerned specifically with applications. It explores the growth and preparation of new materials, as well as their processing, fabrication, bonding and encapsulation, together with the reliability, failure analysis, quality assurance and characterization related to the whole range of applications in electronics. The Journal presents papers in newly developing fields such as low dimensional structures and devices, optoelectronics including III-V compounds, glasses and linear/non-linear crystal materials and lasers, high Tc superconductors, conducting polymers, thick film materials and new contact technologies, as well as the established electronics device and circuit materials.
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