Zhan Hua Li, Jia Xing He, Jia Yu Li, Ke Xu, Xiao Hu Lv, Ming-de Li, Chao Ping Liu, Kin Man Yu, Jian Dong Ye
{"title":"Native Defect-Dependent Ultrafast Carrier Dynamics in p-Type Dopable Wide-Bandgap NiO","authors":"Zhan Hua Li, Jia Xing He, Jia Yu Li, Ke Xu, Xiao Hu Lv, Ming-de Li, Chao Ping Liu, Kin Man Yu, Jian Dong Ye","doi":"10.1021/acs.jpclett.4c02959","DOIUrl":null,"url":null,"abstract":"NiO is a wide-bandgap p-type metal oxide that has extensive applications in optoelectronics and photocatalysts. Understanding the carrier dynamics in p-type NiO is pivotal for optimizing device performance, yet they remain largely unexplored. In this study, we employed femtosecond transient absorption spectroscopy to delve into the dynamics of photogenerated carriers in NiO films containing distinct prominent native defects: undoped NiO with oxygen vacancies (<i>V</i><sub>O</sub>) and O-rich NiO (denoted as NiO<sub>1+δ</sub>) with nickel vacancies (<i>V</i><sub>Ni</sub>). Our findings unveil significant disparities between the two types of NiO thin films. The undoped NiO film exhibits a broad photoinduced absorption signal spanning the spectral range of 360–600 nm, whereas a photobleaching signal within the spectral range of 400–600 nm is observed in the O-rich NiO<sub>1+δ</sub> film, which can be attributed to their unique native defects. We ascertain that the fast formation of small electron polarons (SEPs) occurs within a delay time of approximately 200 fs. Subsequently, the photogenerated carriers undergo rapid trapping by localized states (e.g., grain boundary states) in undoped NiO and O-rich NiO<sub>1+δ</sub> within time scales of around 1–8 and 5–7 ps, respectively, followed by relatively slow trapping and recombination processes via native defects <i>V</i><sub>O</sub> and <i>V</i><sub>Ni</sub> within time scales of approximately 200 ps and ∼2 ns, respectively. These findings illuminate the fundamental processes governing carrier dynamics in NiO thin films with different native defects, offering crucial insights for the advancement of NiO-based devices.","PeriodicalId":62,"journal":{"name":"The Journal of Physical Chemistry Letters","volume":"24 1","pages":""},"PeriodicalIF":4.8000,"publicationDate":"2024-12-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"The Journal of Physical Chemistry Letters","FirstCategoryId":"1","ListUrlMain":"https://doi.org/10.1021/acs.jpclett.4c02959","RegionNum":2,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"CHEMISTRY, PHYSICAL","Score":null,"Total":0}
引用次数: 0
Abstract
NiO is a wide-bandgap p-type metal oxide that has extensive applications in optoelectronics and photocatalysts. Understanding the carrier dynamics in p-type NiO is pivotal for optimizing device performance, yet they remain largely unexplored. In this study, we employed femtosecond transient absorption spectroscopy to delve into the dynamics of photogenerated carriers in NiO films containing distinct prominent native defects: undoped NiO with oxygen vacancies (VO) and O-rich NiO (denoted as NiO1+δ) with nickel vacancies (VNi). Our findings unveil significant disparities between the two types of NiO thin films. The undoped NiO film exhibits a broad photoinduced absorption signal spanning the spectral range of 360–600 nm, whereas a photobleaching signal within the spectral range of 400–600 nm is observed in the O-rich NiO1+δ film, which can be attributed to their unique native defects. We ascertain that the fast formation of small electron polarons (SEPs) occurs within a delay time of approximately 200 fs. Subsequently, the photogenerated carriers undergo rapid trapping by localized states (e.g., grain boundary states) in undoped NiO and O-rich NiO1+δ within time scales of around 1–8 and 5–7 ps, respectively, followed by relatively slow trapping and recombination processes via native defects VO and VNi within time scales of approximately 200 ps and ∼2 ns, respectively. These findings illuminate the fundamental processes governing carrier dynamics in NiO thin films with different native defects, offering crucial insights for the advancement of NiO-based devices.
期刊介绍:
The Journal of Physical Chemistry (JPC) Letters is devoted to reporting new and original experimental and theoretical basic research of interest to physical chemists, biophysical chemists, chemical physicists, physicists, material scientists, and engineers. An important criterion for acceptance is that the paper reports a significant scientific advance and/or physical insight such that rapid publication is essential. Two issues of JPC Letters are published each month.