Multiple Polarization States in Hf1−xZrxO2 Thin Films by Ferroelectric and Antiferroelectric Coupling

IF 27.4 1区 材料科学 Q1 CHEMISTRY, MULTIDISCIPLINARY
Binjian Zeng, Lanyan Yin, Ruiping Liu, Changfan Ju, Qinghua Zhang, Zhibin Yang, Shuaizhi Zheng, Qiangxiang Peng, Qiong Yang, Yichun Zhou, Min Liao
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引用次数: 0

Abstract

HfO2‐based multi‐bit ferroelectric memory combines non‐volatility, speed, and energy efficiency, rendering it a promising technology for massive data storage and processing. However, some challenges remain, notably polarization variation, high operation voltage, and poor endurance performance. Here we show Hf1−xZrxO2 (x = 0.65 to 0.75) thin films grown through sequential atomic layer deposition (ALD) of HfO2 and ZrO2 exhibiting three‐step domain switching characteristic in the form of triple‐peak coercive electric field (EC) distribution. This long‐sought behavior shows nearly no changes even at up to 125 °C and after 1 × 108 electric field cycling. By combining the electrical characterizations and integrated differential phase‐contrast scanning transmission electron microscopy (iDPC‐STEM), we reveal that the triple‐peak EC distribution is driven by the coupling of ferroelectric switching and reversible antiferroelectric–ferroelectric transition. We further demonstrate the 3‐bit per cell operation of the Hf1−xZrxO2 capacitors with excellent device‐to‐device variation and long data retention, by the full switching of individual peaks in the triple‐peak EC. The work represents a significant step in implementing reliable non‐volatile multi‐state ferroelectric devices.

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来源期刊
Advanced Materials
Advanced Materials 工程技术-材料科学:综合
CiteScore
43.00
自引率
4.10%
发文量
2182
审稿时长
2 months
期刊介绍: Advanced Materials, one of the world's most prestigious journals and the foundation of the Advanced portfolio, is the home of choice for best-in-class materials science for more than 30 years. Following this fast-growing and interdisciplinary field, we are considering and publishing the most important discoveries on any and all materials from materials scientists, chemists, physicists, engineers as well as health and life scientists and bringing you the latest results and trends in modern materials-related research every week.
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