Multiple Polarization States in Hf1−xZrxO2 Thin Films by Ferroelectric and Antiferroelectric Coupling

IF 27.4 1区 材料科学 Q1 CHEMISTRY, MULTIDISCIPLINARY
Binjian Zeng, Lanyan Yin, Ruiping Liu, Changfan Ju, Qinghua Zhang, Zhibin Yang, Shuaizhi Zheng, Qiangxiang Peng, Qiong Yang, Yichun Zhou, Min Liao
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Abstract

HfO2-based multi-bit ferroelectric memory combines non-volatility, speed, and energy efficiency, rendering it a promising technology for massive data storage and processing. However, some challenges remain, notably polarization variation, high operation voltage, and poor endurance performance. Here we show Hf1−xZrxO2 (= 0.65 to 0.75) thin films grown through sequential atomic layer deposition (ALD) of HfO2 and ZrO2 exhibiting three-step domain switching characteristic in the form of triple-peak coercive electric field (EC) distribution. This long-sought behavior shows nearly no changes even at up to 125 °C and after 1 × 108 electric field cycling. By combining the electrical characterizations and integrated differential phase-contrast scanning transmission electron microscopy (iDPC-STEM), we reveal that the triple-peak EC distribution is driven by the coupling of ferroelectric switching and reversible antiferroelectric–ferroelectric transition. We further demonstrate the 3-bit per cell operation of the Hf1−xZrxO2 capacitors with excellent device-to-device variation and long data retention, by the full switching of individual peaks in the triple-peak EC. The work represents a significant step in implementing reliable non-volatile multi-state ferroelectric devices.

Abstract Image

铁电与反铁电耦合在Hf1−xZrxO2薄膜中的多极化态
基于HfO2的多比特铁电存储器结合了非易失性、速度和能源效率,使其成为一种有前途的大规模数据存储和处理技术。然而,仍然存在一些挑战,特别是极化变化,高工作电压和耐久性差。在这里,我们展示了通过HfO2和ZrO2的顺序原子层沉积(ALD)生长的Hf1−xZrxO2 (x = 0.65至0.75)薄膜,以三峰矫顽力电场(EC)分布的形式表现出三步畴开关特性。即使在125°C和1 × 108次电场循环后,这种长期寻找的行为几乎没有变化。通过结合电特性和集成差分相对比扫描透射电子显微镜(iDPC - STEM),我们发现三峰EC分布是由铁电开关和可逆反铁电-铁电转变耦合驱动的。我们进一步证明了Hf1−xZrxO2电容器具有优异的器件间变化和长时间数据保留的每单元3位操作,通过完全切换三峰EC中的单个峰。这项工作代表了实现可靠的非易失性多态铁电器件的重要一步。
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来源期刊
Advanced Materials
Advanced Materials 工程技术-材料科学:综合
CiteScore
43.00
自引率
4.10%
发文量
2182
审稿时长
2 months
期刊介绍: Advanced Materials, one of the world's most prestigious journals and the foundation of the Advanced portfolio, is the home of choice for best-in-class materials science for more than 30 years. Following this fast-growing and interdisciplinary field, we are considering and publishing the most important discoveries on any and all materials from materials scientists, chemists, physicists, engineers as well as health and life scientists and bringing you the latest results and trends in modern materials-related research every week.
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