{"title":"Solution-processed nickel oxide passivation on large-area silicon electrodes for efficient photoelectrochemical water splitting†","authors":"Da-Young Lee, Hye-Min Shin and Myung-Han Yoon","doi":"10.1039/D4RA06774F","DOIUrl":null,"url":null,"abstract":"<p >Photoelectrochemical water splitting is a promising technology for converting solar energy into chemical energy. For this system to be practically viable, the materials and processes employed for photoelectrode fabrication should be cost-effective and scalable. Herein, we report the large-scale fabrication of nickel oxide-coated n-type silicon (n-Si) photoanodes <em>via</em> chemical bath deposition for efficient photoelectrochemical water oxidation. The conditions for depositing the nickel oxide-based passivation coating on n-Si electrodes were systematically optimized in terms of precursor immersion time and annealing temperature, while surface morphology and electrochemical properties were cautiously characterized. Finally, the fabrication of practically-useful large-area photoanodes were demonstrated by incorporating the solution-processed nickel oxide passivation layer onto 3-dimensionally structured 4-inch n-Si wafers with enlarged surface areas and diminished light reflection.</p>","PeriodicalId":102,"journal":{"name":"RSC Advances","volume":" 54","pages":" 40180-40186"},"PeriodicalIF":3.9000,"publicationDate":"2024-12-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://pubs.rsc.org/en/content/articlepdf/2024/ra/d4ra06774f?page=search","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"RSC Advances","FirstCategoryId":"92","ListUrlMain":"https://pubs.rsc.org/en/content/articlelanding/2024/ra/d4ra06774f","RegionNum":3,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"CHEMISTRY, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0
Abstract
Photoelectrochemical water splitting is a promising technology for converting solar energy into chemical energy. For this system to be practically viable, the materials and processes employed for photoelectrode fabrication should be cost-effective and scalable. Herein, we report the large-scale fabrication of nickel oxide-coated n-type silicon (n-Si) photoanodes via chemical bath deposition for efficient photoelectrochemical water oxidation. The conditions for depositing the nickel oxide-based passivation coating on n-Si electrodes were systematically optimized in terms of precursor immersion time and annealing temperature, while surface morphology and electrochemical properties were cautiously characterized. Finally, the fabrication of practically-useful large-area photoanodes were demonstrated by incorporating the solution-processed nickel oxide passivation layer onto 3-dimensionally structured 4-inch n-Si wafers with enlarged surface areas and diminished light reflection.
期刊介绍:
An international, peer-reviewed journal covering all of the chemical sciences, including multidisciplinary and emerging areas. RSC Advances is a gold open access journal allowing researchers free access to research articles, and offering an affordable open access publishing option for authors around the world.