Microreactor-Assisted Soft Lithography for Rapid and Inexpensive Patterning of Nanostructured ZnO/CuO Heterojunctions

IF 3.4 3区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY
Zhongwei Gao, V. Vinay K. Doddapaneni, Changqing Pan, Rajiv Malhotra, Chih-hung Chang
{"title":"Microreactor-Assisted Soft Lithography for Rapid and Inexpensive Patterning of Nanostructured ZnO/CuO Heterojunctions","authors":"Zhongwei Gao,&nbsp;V. Vinay K. Doddapaneni,&nbsp;Changqing Pan,&nbsp;Rajiv Malhotra,&nbsp;Chih-hung Chang","doi":"10.1002/adem.202470065","DOIUrl":null,"url":null,"abstract":"<p><b>Microreactor-Assisted Soft Lithography</b>\n </p><p>In article number 2401112, Chih-hung Chang and co-workers demonstrate a novel microreactor-assisted soft lithography process to deposit nanostructures with multiscale 3D geometric shapes and fabricate p-n heterojunction with n-type ZnO and p-type CuO. Factors determining the printing process are studied based on COMSOL simulation and experimental results. This novel process enables the scalable fabrication of complicated functional nanostructures on the desired regions using low-cost and facile solution-based methods.\n\n <figure>\n <div><picture>\n <source></source></picture><p></p>\n </div>\n </figure></p>","PeriodicalId":7275,"journal":{"name":"Advanced Engineering Materials","volume":"26 23","pages":""},"PeriodicalIF":3.4000,"publicationDate":"2024-12-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/adem.202470065","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Advanced Engineering Materials","FirstCategoryId":"88","ListUrlMain":"https://onlinelibrary.wiley.com/doi/10.1002/adem.202470065","RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
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Abstract

Microreactor-Assisted Soft Lithography

In article number 2401112, Chih-hung Chang and co-workers demonstrate a novel microreactor-assisted soft lithography process to deposit nanostructures with multiscale 3D geometric shapes and fabricate p-n heterojunction with n-type ZnO and p-type CuO. Factors determining the printing process are studied based on COMSOL simulation and experimental results. This novel process enables the scalable fabrication of complicated functional nanostructures on the desired regions using low-cost and facile solution-based methods.

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来源期刊
Advanced Engineering Materials
Advanced Engineering Materials 工程技术-材料科学:综合
CiteScore
5.70
自引率
5.60%
发文量
544
审稿时长
1.7 months
期刊介绍: Advanced Engineering Materials is the membership journal of three leading European Materials Societies - German Materials Society/DGM, - French Materials Society/SF2M, - Swiss Materials Federation/SVMT.
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