High-Yield Production of High-κ/Metal Gate Nanopattern Array for 2D Devices via Oxidation-Assisted Etching Approach (Small 51/2024)

IF 13 2区材料科学 Q1 CHEMISTRY, MULTIDISCIPLINARY

Small Pub Date : 2024-12-19 DOI:10.1002/smll.202470378

Weida Hong, Jiejun Zhang, Daobing Zeng, Chen Wang, Zhongying Xue, Miao Zhang, Ziao Tian, Zengfeng Di

引用次数: 0

Abstract

Nanopattern Arrays

High-performance high-?/metal gate (HKMG) structures are crucial for advanced electronics. In article number 2403187, Ziao Tian, Zengfeng Di, and co-workers introduce an innovative oxidation-assisted etching method for large-scale, high-yield HKMG arrays with 150 nm resolution. By controlling aluminum to alumina transition on 2D materials, a process compatible with existing semiconductor techniques is achieved, promising for VLSI circuit applications and nanoelectronics advancement.

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来源期刊

Small 工程技术-材料科学：综合

CiteScore

17.70

自引率

3.80%

发文量

1830

审稿时长

2.1 months

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