Formation of Ultrasmooth Highly Orientated ZnO Films on Amorphous Surface (SiO2/Si) by Magnetron Sputtering

IF 0.5 Q4 PHYSICS, CONDENSED MATTER
A. M. Ismailov, T. A. Guidalaeva, A. E. Muslimov, Yu. V. Grigoriev, V. M. Kanevsky
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引用次数: 0

Abstract

The influence of temperature of amorphous SiO2/Si substrates on the formation of ultrasmooth highly oriented ZnO(0001) films by direct current magnetron sputtering has been studied. It has been shown that ZnO films obtained at a substrate temperature of 500°С have a lamellar shape of crystallites regardless of the growth rate in the range 1–7 nm/s. This feature of the crystallite morphology is associated with a minimum root-mean-square surface roughness of 0.9 nm for traditional high-speed deposition methods. The ultrasmooth surface of the films and the lamellar shape of the ZnO crystallites are mainly due to the two-dimensional mechanism of film formation under conditions of charging the growing surface in the magnetron discharge plasma.

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来源期刊
CiteScore
0.90
自引率
25.00%
发文量
144
审稿时长
3-8 weeks
期刊介绍: Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques publishes original articles on the topical problems of solid-state physics, materials science, experimental techniques, condensed media, nanostructures, surfaces of thin films, and phase boundaries: geometric and energetical structures of surfaces, the methods of computer simulations; physical and chemical properties and their changes upon radiation and other treatments; the methods of studies of films and surface layers of crystals (XRD, XPS, synchrotron radiation, neutron and electron diffraction, electron microscopic, scanning tunneling microscopic, atomic force microscopic studies, and other methods that provide data on the surfaces and thin films). Articles related to the methods and technics of structure studies are the focus of the journal. The journal accepts manuscripts of regular articles and reviews in English or Russian language from authors of all countries. All manuscripts are peer-reviewed.
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