{"title":"Water Absorption of Underwater Products by Additive Manufacturing.","authors":"Andrea Pino, Iván Ibáñez-Felip, Rosario Vidal","doi":"10.3390/ma17235953","DOIUrl":null,"url":null,"abstract":"<p><p>Rapid prototyping techniques offer significant advantages in terms of fabrication speed, accessibility, and low cost. This study explores the use of low-cost stereolithographic resins to produce prototypes intended for underwater conditions. The objective is to evaluate the feasibility of different low-cost resin brands by identifying their water absorption percentage and their response in terms of appearance and deformation after prolonged exposure to an underwater environment. Through three different tests, the suitability of the resins and possible coatings is evaluated, allowing for obtaining data not disclosed by commercial manufacturers and indicating that there are low-cost brands that offer water absorption levels suitable for underwater use. The coefficients for water absorption at saturation begin at 3.3% in saltwater and increase for chlorinated water. Additionally, significant insights are gained regarding the use of coatings. It is found that coatings commonly applied to filament-printed prototypes are generally less suitable for parts produced through stereolithography intended for underwater applications. The most effective strategy is to avoid using coatings altogether.</p>","PeriodicalId":18281,"journal":{"name":"Materials","volume":"17 23","pages":""},"PeriodicalIF":3.1000,"publicationDate":"2024-12-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.ncbi.nlm.nih.gov/pmc/articles/PMC11643832/pdf/","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Materials","FirstCategoryId":"88","ListUrlMain":"https://doi.org/10.3390/ma17235953","RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"CHEMISTRY, PHYSICAL","Score":null,"Total":0}
引用次数: 0
Abstract
Rapid prototyping techniques offer significant advantages in terms of fabrication speed, accessibility, and low cost. This study explores the use of low-cost stereolithographic resins to produce prototypes intended for underwater conditions. The objective is to evaluate the feasibility of different low-cost resin brands by identifying their water absorption percentage and their response in terms of appearance and deformation after prolonged exposure to an underwater environment. Through three different tests, the suitability of the resins and possible coatings is evaluated, allowing for obtaining data not disclosed by commercial manufacturers and indicating that there are low-cost brands that offer water absorption levels suitable for underwater use. The coefficients for water absorption at saturation begin at 3.3% in saltwater and increase for chlorinated water. Additionally, significant insights are gained regarding the use of coatings. It is found that coatings commonly applied to filament-printed prototypes are generally less suitable for parts produced through stereolithography intended for underwater applications. The most effective strategy is to avoid using coatings altogether.
期刊介绍:
Materials (ISSN 1996-1944) is an open access journal of related scientific research and technology development. It publishes reviews, regular research papers (articles) and short communications. Our aim is to encourage scientists to publish their experimental and theoretical results in as much detail as possible. Therefore, there is no restriction on the length of the papers. The full experimental details must be provided so that the results can be reproduced. Materials provides a forum for publishing papers which advance the in-depth understanding of the relationship between the structure, the properties or the functions of all kinds of materials. Chemical syntheses, chemical structures and mechanical, chemical, electronic, magnetic and optical properties and various applications will be considered.