Antimicrobial Resistance Profiles and mupA Gene Characterization of Staphylococcus epidermidis Recovered from Facial Skin of Healthy Females in Shanghai, China.
Bingqing Chen, Lingyun Yao, Rongjuan Cai, Wei Chen, Yue Wang
{"title":"Antimicrobial Resistance Profiles and <i>mupA</i> Gene Characterization of <i>Staphylococcus epidermidis</i> Recovered from Facial Skin of Healthy Females in Shanghai, China.","authors":"Bingqing Chen, Lingyun Yao, Rongjuan Cai, Wei Chen, Yue Wang","doi":"10.2147/CCID.S481517","DOIUrl":null,"url":null,"abstract":"<p><strong>Purpose: </strong>To explore antimicrobial resistance profiles and <i>mupA</i> gene characterization of <i>Staphylococcus epidermidis</i> recovered from facial skin of healthy females in Shanghai, China.</p><p><strong>Patients and methods: </strong>In this study, we collected facial skin samples from 107 healthy females in Shanghai, China, and <i>S. epidermidis</i> isolation was performed. The minimal inhibitory concentrations of 10 antibiotics were determined for the <i>S. epidermidis</i> isolates using the agar dilution method. High-level mupirocin-resistant isolates were subjected to whole-genome sequencing and bioinformatics analysis. A total of 94 un-duplicated <i>S. epidermidis</i> isolates were obtained from 107 facial skin samples.</p><p><strong>Results: </strong>Antimicrobial susceptibility tests revealed that 23.4% of the 94 <i>S. epidermidis</i> isolates were resistant to oxacillin and positive for the <i>mecA</i> gene, which could be cauterized as methicillin-resistant <i>S. epidermidis</i> (MRSE). Resistance rates for erythromycin, clindamycin, tetracycline, ciprofloxacin, and gentamicin were 8.5%, 11.7%, 10.6%, 12.8%, and 1.1%, respectively. For mupirocin, the rates of low- and high-level resistance were 3.2% (3/94) and 11.7% (11/94), respectively. Resistance to vancomycin or linezolid was not observed. High-level mupirocin resistance in facial skin isolates is mediated by <i>mupA</i>. WGS and SNP-based phylogenetic analyses revealed diverse phylogenies among the 11 <i>mupA</i>-positive <i>S. epidermidis</i> isolates. Additionally, various resistance and virulence genes were identified in <i>mupA</i>-positive isolates. A new hybrid plasmid carrying <i>mupA</i> genes was found in two <i>S. epidermidis</i> isolates.</p><p><strong>Conclusion: </strong>We observed a considerable level of antimicrobial resistance to several antibiotics and the prevalence of abundant and diverse resistance and virulence genes in the facial skin-origin <i>S. epidermidis</i> isolates. This may pose a potential risk for both public health and <i>S. epidermidis</i> infection.</p>","PeriodicalId":10447,"journal":{"name":"Clinical, Cosmetic and Investigational Dermatology","volume":"17 ","pages":"2813-2821"},"PeriodicalIF":1.9000,"publicationDate":"2024-12-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.ncbi.nlm.nih.gov/pmc/articles/PMC11639884/pdf/","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Clinical, Cosmetic and Investigational Dermatology","FirstCategoryId":"3","ListUrlMain":"https://doi.org/10.2147/CCID.S481517","RegionNum":4,"RegionCategory":"医学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"2024/1/1 0:00:00","PubModel":"eCollection","JCR":"Q3","JCRName":"DERMATOLOGY","Score":null,"Total":0}
引用次数: 0
Abstract
Purpose: To explore antimicrobial resistance profiles and mupA gene characterization of Staphylococcus epidermidis recovered from facial skin of healthy females in Shanghai, China.
Patients and methods: In this study, we collected facial skin samples from 107 healthy females in Shanghai, China, and S. epidermidis isolation was performed. The minimal inhibitory concentrations of 10 antibiotics were determined for the S. epidermidis isolates using the agar dilution method. High-level mupirocin-resistant isolates were subjected to whole-genome sequencing and bioinformatics analysis. A total of 94 un-duplicated S. epidermidis isolates were obtained from 107 facial skin samples.
Results: Antimicrobial susceptibility tests revealed that 23.4% of the 94 S. epidermidis isolates were resistant to oxacillin and positive for the mecA gene, which could be cauterized as methicillin-resistant S. epidermidis (MRSE). Resistance rates for erythromycin, clindamycin, tetracycline, ciprofloxacin, and gentamicin were 8.5%, 11.7%, 10.6%, 12.8%, and 1.1%, respectively. For mupirocin, the rates of low- and high-level resistance were 3.2% (3/94) and 11.7% (11/94), respectively. Resistance to vancomycin or linezolid was not observed. High-level mupirocin resistance in facial skin isolates is mediated by mupA. WGS and SNP-based phylogenetic analyses revealed diverse phylogenies among the 11 mupA-positive S. epidermidis isolates. Additionally, various resistance and virulence genes were identified in mupA-positive isolates. A new hybrid plasmid carrying mupA genes was found in two S. epidermidis isolates.
Conclusion: We observed a considerable level of antimicrobial resistance to several antibiotics and the prevalence of abundant and diverse resistance and virulence genes in the facial skin-origin S. epidermidis isolates. This may pose a potential risk for both public health and S. epidermidis infection.
期刊介绍：
Clinical, Cosmetic and Investigational Dermatology is an international, peer-reviewed, open access journal that focuses on the latest clinical and experimental research in all aspects of skin disease and cosmetic interventions. Normal and pathological processes in skin development and aging, their modification and treatment, as well as basic research into histology of dermal and dermal structures that provide clinical insights and potential treatment options are key topics for the journal.
Patient satisfaction, preference, quality of life, compliance, persistence and their role in developing new management options to optimize outcomes for target conditions constitute major areas of interest.
The journal is characterized by the rapid reporting of clinical studies, reviews and original research in skin research and skin care.
All areas of dermatology will be covered; contributions will be welcomed from all clinicians and basic science researchers globally.
求助内容：
应助结果提醒方式：
京公网安备 11010802042870号
