The current–voltage (I–V) characteristics and low–high impedance measurements (C/G–V) of Au/(AgCdS:PVP)/n-Si Schottky diode (SD) at dark and under illumination conditions

IF 2.8 4区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC
G. Aslanbaş, P. Durmuş, Ş. Altındal, Y. Azizian-Kalandaragh
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引用次数: 0

Abstract

In this study, Schottky diode (SD) with a structure of Au/(AgCdS:PVP)/n-Si has been fabricated and then its electrical parameters and conduction mechanisms (CMs) investigated by measuring current–voltage (I–V) and capacitance/conductance–voltage (C/G–V) data in dark and under 100-mW cm−2 illumination intensity at room temperature (RT). These measurements show that almost all basic electrical parameters and CM depend on illumination, frequency, and voltage. The energy/voltage-dependent profile of surface states (Nss) was extracted from the forward bias I–V data considering voltage dependence of ideality factor (n), barrier height, and low/high-frequency capacitance model. The density of doping atoms (Nd), barrier height (ΦB(C–V)), and the width of depletion region (Wd) were also computed by the linear zone of the reverse bias C−2–V plot at a frequency of 1 MHz, and the dark conditions. The maximum photosensitivity and photoresponsivity were found as 384 and 7.5 mW A−1 under 100 mW cm−2, respectively. Based on the experimental findings, the Au/(AgCdS:PVP)/n-Si SD has good rectifier and photodiode behavior and hence, it can be successfully used in electronic and optoelectronic applications rather than conventional metal–semiconductor (MS)-type SD with/without an insulator layer grown by traditional techniques considering the advantages of polymers, such as high mechanical strength, low-cost production, and low energy consumption.

Abstract Image

金/(AgCdS:PVP)/n-硅肖特基二极管(SD)在黑暗和光照条件下的电流-电压(I-V)特性和低高阻抗测量(C/G-V
本研究制作了金/(AgCdS:PVP)/n-Si 结构的肖特基二极管(SD),然后通过测量暗处和室温(RT)下 100 mW cm-2 光照强度下的电流-电压(I-V)和电容/电导-电压(C/G-V)数据,研究了其电气参数和传导机制(CM)。这些测量结果表明,几乎所有基本电参数和 CM 都取决于光照、频率和电压。考虑到意向系数(n)、势垒高度和低/高频电容模型的电压依赖性,我们从正向偏压 I-V 数据中提取了与能量/电压相关的表面态(Nss)曲线。在频率为 1 MHz 和黑暗条件下,还通过反向偏压 C-2-V 图的线性区计算了掺杂原子密度 (Nd)、势垒高度 (ΦB(C-V))和耗尽区宽度 (Wd)。在 100 mW cm-2 条件下,最大光敏度和光致发光率分别为 384 mW A-1 和 7.5 mW A-1。根据实验结果,Au/(AgCdS:PVP)/n-Si SD 具有良好的整流和光电二极管性能,因此,考虑到聚合物的高机械强度、低成本生产和低能耗等优点,它比传统技术生长的带/不带绝缘层的金属半导体(MS)型 SD 更能成功地应用于电子和光电领域。
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来源期刊
Journal of Materials Science: Materials in Electronics
Journal of Materials Science: Materials in Electronics 工程技术-材料科学:综合
CiteScore
5.00
自引率
7.10%
发文量
1931
审稿时长
2 months
期刊介绍: The Journal of Materials Science: Materials in Electronics is an established refereed companion to the Journal of Materials Science. It publishes papers on materials and their applications in modern electronics, covering the ground between fundamental science, such as semiconductor physics, and work concerned specifically with applications. It explores the growth and preparation of new materials, as well as their processing, fabrication, bonding and encapsulation, together with the reliability, failure analysis, quality assurance and characterization related to the whole range of applications in electronics. The Journal presents papers in newly developing fields such as low dimensional structures and devices, optoelectronics including III-V compounds, glasses and linear/non-linear crystal materials and lasers, high Tc superconductors, conducting polymers, thick film materials and new contact technologies, as well as the established electronics device and circuit materials.
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