Editorial for focus on emerging processes and applications of atomic and molecular layer deposition.

IF 2.9 4区材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY

Nanotechnology Pub Date : 2024-12-20 DOI:10.1088/1361-6528/ad9d4b

Xiangbo Meng, Jeffrey W Elam, Sean Barry

引用次数: 0

Abstract

This Focus aims to provide a platform for the latest research progress in atomic and molecular layer deposition (ALD and MLD), which collects 10 original research articles and 2 review papers. The original research articles present new precursors, new processes, and new applications. The review papers give a timely summary on the surface chemistry of metal ALD processes and flexible electronics resulting from ALD and MLD, respectively. This ensemble forms a valuable collection that advances our understanding and knowledge of ALD and MLD, and inspires the continued development of these valuable technologies.

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来源期刊

Nanotechnology 工程技术-材料科学：综合

CiteScore

7.10

自引率

5.70%

发文量

820

审稿时长

2.5 months

期刊介绍： The journal aims to publish papers at the forefront of nanoscale science and technology and especially those of an interdisciplinary nature. Here, nanotechnology is taken to include the ability to individually address, control, and modify structures, materials and devices with nanometre precision, and the synthesis of such structures into systems of micro- and macroscopic dimensions such as MEMS based devices. It encompasses the understanding of the fundamental physics, chemistry, biology and technology of nanometre-scale objects and how such objects can be used in the areas of computation, sensors, nanostructured materials and nano-biotechnology.