Photoelectric characteristic of single-phase InxGa1-xN films with tunable bandgap through RF magnetron sputtering

IF 3.5 3区材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY

Journal of Materials Science Pub Date : 2024-12-02 DOI:10.1007/s10853-024-10434-9

Ziyuan Li, Longhai Shen, Ouxiang Zhou, Xiaotian Zhu, Yu Zhang, Quhui Wang, Dongli Qi, Xinglai Zhang, Mengyao Han, Junhao Xu, Ye Chen, Yuhao Li

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Abstract

In_xGa_1-xN films with tunable bandgap hold significant potential for photoelectric applications, particularly in wavelength-selective and UV–visible photodetection. Herein, a unique target was designed to prepare bandgap-tunable In_xGa_1-xN films by RF (radio frequency) magnetron sputtering. By adjusting the RF power to change the In content (x value), we prepared In_xGa_1-xN films with bandgap variations in the range of 2.15–2.63 eV. Upon further investigation, it was found that the grown In_xGa_1-xN films had hexagonal structure and did not undergo phase separation in the In-rich composition. With the increase of In content from 0.46 to 0.60, the preferred orientation of the In_xGa_1-xN films changed from (101) to (100) plane, while the surface morphology of the In_xGa_1-xN films changed from worm-like to spherical grains. Photoluminescence peaks of In_xGa_1-xN films was composed of intrinsic and defect luminescence. Under irradiation of 450 and 650 nm laser, the responsivity of the In_xGa_1-xN metal–semiconductor-metal photodetector can reach 5.15 × 10⁻⁷ and 3.2 × 10⁻⁷ A/W, and the fastest response time can reach 1.28 and 1.32 s, respectively.

Graphical Abstract

Abstract Image

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带隙可调的单相InxGa1-xN薄膜的射频磁控溅射光电特性

具有可调带隙的InxGa1-xN薄膜在光电应用方面具有重要的潜力，特别是在波长选择和紫外可见光探测方面。本文设计了一种独特的靶材，通过射频磁控溅射制备带隙可调的InxGa1-xN薄膜。通过调节射频功率来改变In含量（x值），我们制备了带隙变化在2.15-2.63 eV范围内的InxGa1-xN薄膜。进一步研究发现，生长的InxGa1-xN薄膜具有六方结构，并且在富in成分中没有发生相分离。随着In含量从0.46增加到0.60，InxGa1-xN膜的优先取向由（101）面变为（100）面，InxGa1-xN膜的表面形貌由蠕虫状晶粒变为球形晶粒。InxGa1-xN薄膜的光致发光峰由本征发光峰和缺陷发光峰组成。在450 nm和650 nm激光照射下，InxGa1-xN金属-半导体-金属光电探测器的响应率可达5.15 × 10−7和3.2 × 10−7 A/W，最快响应时间分别可达1.28和1.32 s。图形抽象

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来源期刊

Journal of Materials Science 工程技术-材料科学：综合

CiteScore

7.90

自引率

4.40%

发文量

1297

审稿时长

2.4 months

期刊介绍： The Journal of Materials Science publishes reviews, full-length papers, and short Communications recording original research results on, or techniques for studying the relationship between structure, properties, and uses of materials. The subjects are seen from international and interdisciplinary perspectives covering areas including metals, ceramics, glasses, polymers, electrical materials, composite materials, fibers, nanostructured materials, nanocomposites, and biological and biomedical materials. The Journal of Materials Science is now firmly established as the leading source of primary communication for scientists investigating the structure and properties of all engineering materials.