Polarization-Induced Internal Electric Field-Dominated S-Scheme KNbO3-CuO Heterojunction for Photoreduction of CO2 with High CH4 Selectivity.

IF 8.3 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY
ACS Applied Materials & Interfaces Pub Date : 2024-12-18 Epub Date: 2024-12-04 DOI:10.1021/acsami.4c16163
Fei Liu, Pengfei Li, Zoufei Du, Lidan Lan, Haijiao Xie, Yi Dan, Yun Huang, Long Jiang
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引用次数: 0

Abstract

The polarization-induced internal electric field (IEF) in ferroelectric materials could promote photogenerated charge transfer across the heterojunction interface, but the effect of polarization-induced IEF on the mechanism of photogenerated charge transfer is ambiguous. In this study, a KNbO3-CuO heterojunction was synthesized by depositing copper oxide (CuO) onto KNbO3. Incorporating CuO broadens the light absorption of KNbO3, thereby enhancing the dissociation of the photogenerated charges. The results show that the polarization-induced IEF in KNbO3 determines that the charge transport mechanism in the KNbO3-CuO heterojunction follows the S-scheme. Owing to the S-scheme heterojunctions and efficient CO2 capture and activation by CuO, the CH4 production rate of KNbO3-CuO increased by nearly 26 times compared to KNbO3. Additionally, the CH4 selectivity of KNbO3-CuO could reach up to 97.80%. This research offers valuable insights into enhancing the photogenerated charge separation and constructing heterojunctions.

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来源期刊
ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
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