Planarizing Spalled GaAs(100) Surfaces by MOVPE Growth

IF 3.2 2区 化学 Q2 CHEMISTRY, MULTIDISCIPLINARY
Gavin P. Forcade, William E. McMahon, Nicholas Yoo, Anica N. Neumann, Michelle Young, John Goldsmith, Sarah Collins, Karin Hinzer, Corinne E. Packard and Myles A. Steiner*, 
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Abstract

III–V photovoltaic devices have demonstrated exceptional performance across various applications, with controlled crystal fracturing, known as controlled spalling, emerging as a promising method to reduce costs by enabling substrate reuse. Spalling GaAs(100) substrates, a commonly used substrate in III–V photovoltaics, results in faceted ridges that must be planarized to grow high-quality photovoltaic devices. Here we demonstrate that a GaAs(100) wafer offcut toward [01̅1] and spalled toward [011] can be efficiently planarized by growing C:GaAs by metal–organic vapor phase epitaxy (MOVPE) on the surface, with up to 95% of the nominally deposited material used to fill the valleys between ridges. We find that reducing the offcut to 2° enhances the planarizing capability of C:GaAs. A surface morphology model indicates that the density of surface dangling bonds significantly influences the growth evolution of undoped GaAs surfaces. In contrast, the model suggests that the effectiveness of C:GaAs as a smoothing layer stems from modifying the atomic surface structure and, consequently, the associated sticking coefficients of the facets, which can alter the evolution of surface morphology. Our findings provide guidelines for the epitaxial planarization of semiconductor surfaces and improve the understanding of MOVPE growth on nonplanar surfaces.

Abstract Image

利用MOVPE生长使剥落的GaAs(100)表面平面化
III-V型光伏设备在各种应用中表现出卓越的性能,可控晶体破裂(称为可控剥落)成为一种有前途的方法,通过实现衬底再利用来降低成本。GaAs(100)衬底是III-V型光伏电池中常用的衬底,剥落会产生多面脊,必须将其平面化才能生长高质量的光伏器件。在这里,我们证明了通过金属有机气相外延(MOVPE)在表面生长C:GaAs,可以有效地将GaAs(100)晶圆沿[01′1]方向的边切和沿[011]方向的剥落平面化,高达95%的名义沉积材料用于填充脊之间的山谷。我们发现,将截断角减小到2°可以提高C:GaAs的平面化能力。表面形貌模型表明,表面悬空键的密度显著影响未掺杂GaAs表面的生长演化。相反,该模型表明,C:GaAs作为平滑层的有效性源于改变原子表面结构,从而改变相关的表面粘附系数,这可以改变表面形态的演变。我们的发现为半导体表面的外延平面化提供了指导,并提高了对非平面表面上MOVPE生长的理解。
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来源期刊
Crystal Growth & Design
Crystal Growth & Design 化学-材料科学:综合
CiteScore
6.30
自引率
10.50%
发文量
650
审稿时长
1.9 months
期刊介绍: The aim of Crystal Growth & Design is to stimulate crossfertilization of knowledge among scientists and engineers working in the fields of crystal growth, crystal engineering, and the industrial application of crystalline materials. Crystal Growth & Design publishes theoretical and experimental studies of the physical, chemical, and biological phenomena and processes related to the design, growth, and application of crystalline materials. Synergistic approaches originating from different disciplines and technologies and integrating the fields of crystal growth, crystal engineering, intermolecular interactions, and industrial application are encouraged.
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