Feilong Wang , Shuo Wang , Zhiyu Chi , Junbo Niu , Xinghong Zhang , Jinbao Huang , Xinxin Ma
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引用次数: 0
Abstract
In this study, the efficacy of Cr/CrxN multilayer films, fabricated on 8Cr4Mo4V bearing steel substrates via Plasma-Based Ion Implantation and Deposition (PBIID) technique, was thoroughly examined. Utilizing a multifunctional coating apparatus, the surface engineering process was optimized for efficiency and precision, yielding controllable periodic Cr/CrxN films. Characterizations conducted with XPS, XRD, and TEM disclosed a 'stacked' stratified film structure that resonates with the process periodicity, characterized by a 17 nm cycle and consisting of dispersed nanocrystalline (Cr, CrN, and Cr2N). These multilayer structures markedly enhanced the corrosion resistance of the material, with the treated 8Cr4Mo4V specimens demonstrating a corrosion current density of 2.47 × 10−7 A cm−2, which is an order of magnitude reduction compared to the original sample of 7.60 × 10−6 A cm−2. A series equivalent circuit model was developed to simulate the corrosion dynamics. The nitridation effect induced by ion implantation was instrumental in attaining a surface nanohardness of 19 GPa, approximately doubling the original hardness, while also achieving a coating-substrate adhesion force of 105 mN due to the peening effect. This method can be applied to improve the corrosion resistance life of precision parts, especially complex parts.
期刊介绍:
Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences.
A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below.
The scope of the journal includes:
1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes).
2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis.
3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification.
4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.