{"title":"Assessing the assumption of non-Reliance of concentration-dependent interdiffusion coefficient on maximum component concentration","authors":"Soheil Shaker, Samuel Afolabi, Olanrewaju Ojo","doi":"10.1016/j.vacuum.2024.113860","DOIUrl":null,"url":null,"abstract":"<div><div>It is generally assumed that the concentration dependence of the interdiffusion coefficient is a constant material parameter under isothermal conditions, unaffected by the maximum component concentration. Consequently, it is expected that the interdiffusion coefficient obtained from pure-metal/pure-metal diffusion couples can be used to predict diffusion effects, such as concentration profiles in alloy/pure-metal or alloy/alloy diffusion couples within the same binary alloy system, regardless of the maximum component concentration and vice versa. However, this non-trivial assumption neglects the potential influence of diffusion-induced stress on the concentration-dependent interdiffusion coefficient, D(C). This study assesses this assumption, and the results show that predicted concentration profiles based on this common assumption grossly fail to match experimental data. The findings demonstrate that using a constant D(C), irrespective of the maximum component concentration, in the prediction and analysis of diffusion effects can lead to significant errors.</div></div>","PeriodicalId":23559,"journal":{"name":"Vacuum","volume":"232 ","pages":"Article 113860"},"PeriodicalIF":3.8000,"publicationDate":"2024-11-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Vacuum","FirstCategoryId":"88","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0042207X24009060","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0
Abstract
It is generally assumed that the concentration dependence of the interdiffusion coefficient is a constant material parameter under isothermal conditions, unaffected by the maximum component concentration. Consequently, it is expected that the interdiffusion coefficient obtained from pure-metal/pure-metal diffusion couples can be used to predict diffusion effects, such as concentration profiles in alloy/pure-metal or alloy/alloy diffusion couples within the same binary alloy system, regardless of the maximum component concentration and vice versa. However, this non-trivial assumption neglects the potential influence of diffusion-induced stress on the concentration-dependent interdiffusion coefficient, D(C). This study assesses this assumption, and the results show that predicted concentration profiles based on this common assumption grossly fail to match experimental data. The findings demonstrate that using a constant D(C), irrespective of the maximum component concentration, in the prediction and analysis of diffusion effects can lead to significant errors.
期刊介绍:
Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences.
A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below.
The scope of the journal includes:
1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes).
2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis.
3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification.
4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.