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Synergistic impact of Al2O3 capping layer and deposition temperature for enhancing the ferroelectricity of undoped-HfO2 thin films

IF 2.4 4区物理与天体物理 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY

Current Applied Physics Pub Date : 2024-11-28 DOI:10.1016/j.cap.2024.11.016

Sang Han Ko , Seung-Eon Moon , Sung Min Yoon

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引用次数: 0

Abstract

Synergistic effects of Al₂O₃ capping layer and deposition temperature, ranging from 220 to 280 °C, on the ferroelectric properties of undoped HfO₂ thin films were investigated. The use of an Al₂O₃ capping layer during atomic layer deposition (ALD) process was verified to induce a ferroelectric orthorhombic phase in undoped HfO₂ thin films, leading to a net remnant polarization (2P_r) of >20 μC/cm² when deposited <260 °C. The HfO₂ thin film deposited at 240 °C showed a low leakage current density of 5.7 × 10⁻⁶ A/cm² at an electric field of 2 MV/cm, accompanied by a high 2P_r and an endurance of >10⁷ cycles. Furthermore, the switching time for ferroelectric polarization reversal was estimated to range from 2.1 to 1.7 μs in the voltage range of 3.5–4.5 V. The results of this work demonstrated the impact of deposition temperature conditions on the ferroelectric properties of the HfO₂ thin films by means of the Al₂O₃ capping process.

Abstract Image

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Al2O3盖层和沉积温度对未掺杂hfo2薄膜铁电性的协同影响

研究了220 ~ 280℃范围内Al2O3封盖层和沉积温度对未掺杂HfO2薄膜铁电性能的协同效应。在原子层沉积（ALD）过程中使用Al2O3封盖层可以在未掺杂的HfO2薄膜中诱导出铁电正交相，当沉积温度为260℃时，净残余极化（2Pr）为20 μC/cm2。在240°C下沉积的HfO2薄膜在2 MV/cm电场下的漏电流密度为5.7 × 10−6 a /cm2，具有较高的2Pr和107次循环的续航能力。在3.5 ~ 4.5 V电压范围内，铁电极化反转的开关时间为2.1 ~ 1.7 μs。本工作的结果证明了沉积温度条件对HfO2薄膜铁电性能的影响。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Current Applied Physics

Current Applied Physics 物理-材料科学：综合

CiteScore

4.80

自引率

0.00%

发文量

213

审稿时长

33 days

期刊介绍： Current Applied Physics (Curr. Appl. Phys.) is a monthly published international journal covering all the fields of applied science investigating the physics of the advanced materials for future applications. Other areas covered: Experimental and theoretical aspects of advanced materials and devices dealing with synthesis or structural chemistry, physical and electronic properties, photonics, engineering applications, and uniquely pertinent measurement or analytical techniques. Current Applied Physics, published since 2001, covers physics, chemistry and materials science, including bio-materials, with their engineering aspects. It is a truly interdisciplinary journal opening a forum for scientists of all related fields, a unique point of the journal discriminating it from other worldwide and/or Pacific Rim applied physics journals. Regular research papers, letters and review articles with contents meeting the scope of the journal will be considered for publication after peer review. The Journal is owned by the Korean Physical Society.

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