A review of calibration standards, devices and methods for gas flow in semiconductor manufacturing processes

IF 2.3 3区工程技术 Q2 ENGINEERING, MECHANICAL

Flow Measurement and Instrumentation Pub Date : 2024-11-22 DOI:10.1016/j.flowmeasinst.2024.102753

Gaoming Zhang , Boxu Hui , Zhipeng Xu , Bin Zhou , Bengt Sundén , Zhen Cao

{"title":"A review of calibration standards, devices and methods for gas flow in semiconductor manufacturing processes","authors":"Gaoming Zhang , Boxu Hui , Zhipeng Xu , Bin Zhou , Bengt Sundén , Zhen Cao","doi":"10.1016/j.flowmeasinst.2024.102753","DOIUrl":null,"url":null,"abstract":"<div><div>Semiconductor manufacturing involves various gases in about 500 processes of oxidation, vapor deposition, lithography, etching doping, inerting, annealing, and chamber cleaning. To ensure the quality of manufactured semiconductors, accurate and reproducible gas flow measurement and control are necessary. Gas flow standards with low uncertainty are the foundation of accurate gas flow measurements and traceability for flow meters and mass flow controllers used in semiconductor manufacturing. Besides, physical models are significant to calculate or correct the measured flow rate and extrapolate calibration results to unknown gases introduced into the manufacturing process. Thus, in this work the intention is to provide the principles, structures and performances of gas flow standards used for calibration of process gases and corresponding models and methods for gas flow calculation and corrections. The aim is to provide some advice on measurement and calibration of gas flow in semiconductor manufacturing processes.</div></div>","PeriodicalId":50440,"journal":{"name":"Flow Measurement and Instrumentation","volume":"101 ","pages":"Article 102753"},"PeriodicalIF":2.3000,"publicationDate":"2024-11-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Flow Measurement and Instrumentation","FirstCategoryId":"5","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0955598624002334","RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, MECHANICAL","Score":null,"Total":0}

引用次数: 0

Abstract

Semiconductor manufacturing involves various gases in about 500 processes of oxidation, vapor deposition, lithography, etching doping, inerting, annealing, and chamber cleaning. To ensure the quality of manufactured semiconductors, accurate and reproducible gas flow measurement and control are necessary. Gas flow standards with low uncertainty are the foundation of accurate gas flow measurements and traceability for flow meters and mass flow controllers used in semiconductor manufacturing. Besides, physical models are significant to calculate or correct the measured flow rate and extrapolate calibration results to unknown gases introduced into the manufacturing process. Thus, in this work the intention is to provide the principles, structures and performances of gas flow standards used for calibration of process gases and corresponding models and methods for gas flow calculation and corrections. The aim is to provide some advice on measurement and calibration of gas flow in semiconductor manufacturing processes.

查看原文本刊更多论文

求助全文

约1分钟内获得全文求助全文

来源期刊

Flow Measurement and Instrumentation 工程技术-工程：机械

CiteScore

4.30

自引率

13.60%

发文量

123

审稿时长

6 months

期刊介绍： Flow Measurement and Instrumentation is dedicated to disseminating the latest research results on all aspects of flow measurement, in both closed conduits and open channels. The design of flow measurement systems involves a wide variety of multidisciplinary activities including modelling the flow sensor, the fluid flow and the sensor/fluid interactions through the use of computation techniques; the development of advanced transducer systems and their associated signal processing and the laboratory and field assessment of the overall system under ideal and disturbed conditions. FMI is the essential forum for critical information exchange, and contributions are particularly encouraged in the following areas of interest: Modelling: the application of mathematical and computational modelling to the interaction of fluid dynamics with flowmeters, including flowmeter behaviour, improved flowmeter design and installation problems. Application of CAD/CAE techniques to flowmeter modelling are eligible. Design and development: the detailed design of the flowmeter head and/or signal processing aspects of novel flowmeters. Emphasis is given to papers identifying new sensor configurations, multisensor flow measurement systems, non-intrusive flow metering techniques and the application of microelectronic techniques in smart or intelligent systems. Calibration techniques: including descriptions of new or existing calibration facilities and techniques, calibration data from different flowmeter types, and calibration intercomparison data from different laboratories. Installation effect data: dealing with the effects of non-ideal flow conditions on flowmeters. Papers combining a theoretical understanding of flowmeter behaviour with experimental work are particularly welcome.