Molecular dynamics simulation of the formation of carbon structures during carbon vapor deposition on Ni substrate

Abstract

Molecular dynamics simulation of carbon vapor deposition on Ni substrate in the temperature range from 300 to 1750 K was performed. It was found that at temperatures below 1000 K, ordered carbon structures are most actively formed in the gas phase. At temperatures of 1000–1500 K, carbon rings are formed near the surface of the Ni substrate, and close to the melting temperature, no structures are observed.