Effect of thermal treatment on thin films of NiO:WO3 for optoelectronic applications

IF 3.8 3区材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY

Optical Materials Pub Date : 2024-11-17 DOI:10.1016/j.optmat.2024.116419

K.S. Usha , Sang Yeol Lee , R. Sivakumar , C. Sanjeeviraja

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引用次数: 0

Abstract

Nickel oxide (NiO), a semiconducting metal oxide, with its exceptional optical, electrical, and magnetic properties make it highly sought after for use in optical, optoelectronic, and electrochromic devices. Recent advancements in NiO-optical devices relies on the optical parameters like intrinsic optical nonlinearities. The current study involves the deposition of NiO:WO₃ thin films utilizing radio frequency (RF) sputtering at various substrate temperature (T_s) of 100, 200, and 300 °C. An investigation was carried out to analyse the significance of T_s on the structural, optical, morphological, & vibrational characteristics. The X-ray diffraction investigation revealed the amorphous nature of the films. Scanning electron microscopy confirms the compact pinhole free surface of the films. The results of energy dispersive X-ray spectroscopy (EDS) spectra verified the existence of nickel (Ni), oxygen (O), and tungsten (W) components in the films. XPS analysis confirms the presence of both Ni²⁺ and Ni³⁺ states. The optical transmittance increased, and the band gap decreased with increase in T_s. The impact of T_s on various optical parameters such as refractive index, extinction co-efficient, dielectric constants, optical non-linear susceptibility, and dispersion energy parameters obtained by the Wemple-DiDomenico theory has been calculated and extensively investigated. The results indicate that NiO:WO₃ films can be used to fabricate electrochromic and optoelectronic devices.

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热处理对用于光电应用的 NiO:WO3 薄膜的影响

氧化镍（NiO）是一种半导体金属氧化物，具有优异的光学、电学和磁学特性，因此在光学、光电和电致变色装置中的应用备受青睐。镍氧化物光学器件的最新进展有赖于其内在光学非线性等光学参数。目前的研究涉及在 100、200 和 300 °C 的不同基底温度 (Ts) 下利用射频 (RF) 溅射沉积 NiO:WO3 薄膜。研究分析了 Ts 对薄膜的结构、光学、形态和振动特性的影响。X 射线衍射研究揭示了薄膜的无定形性质。扫描电子显微镜证实薄膜表面紧密无针孔。能量色散 X 射线光谱（EDS）结果证实了薄膜中存在镍（Ni）、氧（O）和钨（W）成分。XPS 分析证实了 Ni2+ 和 Ni3+ 状态的存在。随着 Ts 的增加，光学透射率增加，带隙减小。我们计算并广泛研究了 Ts 对各种光学参数的影响，如折射率、消光系数、介电常数、光学非线性电感和由 Wemple-DiDomenico 理论得到的色散能参数。结果表明，NiO:WO3 薄膜可用于制造电致变色和光电器件。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Optical Materials 工程技术-材料科学：综合

CiteScore

6.60

自引率

12.80%

发文量

1265

审稿时长

38 days

期刊介绍： Optical Materials has an open access mirror journal Optical Materials: X, sharing the same aims and scope, editorial team, submission system and rigorous peer review. The purpose of Optical Materials is to provide a means of communication and technology transfer between researchers who are interested in materials for potential device applications. The journal publishes original papers and review articles on the design, synthesis, characterisation and applications of optical materials. OPTICAL MATERIALS focuses on: • Optical Properties of Material Systems; • The Materials Aspects of Optical Phenomena; • The Materials Aspects of Devices and Applications. Authors can submit separate research elements describing their data to Data in Brief and methods to Methods X.