{"title":"Giant Photoluminescence Enhancement of Ga-Doped ZnO Microwires by X-Ray Irradiation","authors":"Siyuan He, Shuiyan Cao, Ying Liu, Wenfa Chen, Pin Lyu, Weidian Li, Jincheng Bao, Wenhui Sun, Caixia Kan, Mingming Jiang, Yanpeng Liu","doi":"10.1002/advs.202407144","DOIUrl":null,"url":null,"abstract":"<p>Ga-doped zinc oxide (ZnO) microwires hold great promise for developing highly efficient light sources because of the wide bandgap with proper exciton binding energy. However, most microwires grown from one mainstream approach, i.e., chemical vapor deposition (CVD), are morphologically and crystallographically defective, exhibiting limited photoluminescence performances. Herein, a simple and effective X-ray irradiation strategy is demonstrated for enhancing the photoluminescence of Ga-doped ZnO microwire in ambient conditions. Under moderate doses (≤ 150 Gy), the photoluminescence monotonically rockets up with X-ray dose increment and achieves nine-fold enhancement at a dose of ≈150 Gy, recording high photoluminescence improvement of ZnO microwires to date. The elemental characteristics under different controlled irradiation atmospheres suggest the elimination of surface oxygen vacancy and the cross-section transmission electron microscope reveals prominent lattice relaxations after mild X-ray irradiation. In addition, the X-ray irradiated microwires further exhibit elevated electroluminescence by over three times. The enhanced photoluminescence and electroluminescence as well as long-term stability enable us to imagine the super-rapid applications of ZnO microwires in modern optoelectronic devices.</p>","PeriodicalId":117,"journal":{"name":"Advanced Science","volume":"12 3","pages":""},"PeriodicalIF":14.1000,"publicationDate":"2024-11-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.ncbi.nlm.nih.gov/pmc/articles/PMC11744572/pdf/","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Advanced Science","FirstCategoryId":"88","ListUrlMain":"https://advanced.onlinelibrary.wiley.com/doi/10.1002/advs.202407144","RegionNum":1,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"CHEMISTRY, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0
Abstract
Ga-doped zinc oxide (ZnO) microwires hold great promise for developing highly efficient light sources because of the wide bandgap with proper exciton binding energy. However, most microwires grown from one mainstream approach, i.e., chemical vapor deposition (CVD), are morphologically and crystallographically defective, exhibiting limited photoluminescence performances. Herein, a simple and effective X-ray irradiation strategy is demonstrated for enhancing the photoluminescence of Ga-doped ZnO microwire in ambient conditions. Under moderate doses (≤ 150 Gy), the photoluminescence monotonically rockets up with X-ray dose increment and achieves nine-fold enhancement at a dose of ≈150 Gy, recording high photoluminescence improvement of ZnO microwires to date. The elemental characteristics under different controlled irradiation atmospheres suggest the elimination of surface oxygen vacancy and the cross-section transmission electron microscope reveals prominent lattice relaxations after mild X-ray irradiation. In addition, the X-ray irradiated microwires further exhibit elevated electroluminescence by over three times. The enhanced photoluminescence and electroluminescence as well as long-term stability enable us to imagine the super-rapid applications of ZnO microwires in modern optoelectronic devices.
掺杂镓的氧化锌(ZnO)微线具有宽带隙和适当的激子结合能,因此在开发高效光源方面大有可为。然而,大多数通过化学气相沉积(CVD)这一主流方法生长的微线在形态和晶体学上都存在缺陷,因此光致发光性能有限。本文展示了一种简单有效的 X 射线辐照策略,可在环境条件下增强掺镓 ZnO 微线的光致发光性能。在中等剂量(≤ 150 Gy)下,光致发光随 X 射线剂量的增加而单调上升,在剂量≈150 Gy 时达到 9 倍的增强,记录了迄今为止 ZnO 微线的高光致发光改进。不同受控辐照气氛下的元素特征表明,表面氧空位已经消除,横截面透射电子显微镜显示轻度 X 射线辐照后晶格发生了明显的弛豫。此外,经过 X 射线辐照的微丝的电致发光进一步提高了三倍以上。光致发光和电致发光的增强以及长期稳定性使我们能够想象氧化锌微线在现代光电器件中的超快速应用。
期刊介绍:
Advanced Science is a prestigious open access journal that focuses on interdisciplinary research in materials science, physics, chemistry, medical and life sciences, and engineering. The journal aims to promote cutting-edge research by employing a rigorous and impartial review process. It is committed to presenting research articles with the highest quality production standards, ensuring maximum accessibility of top scientific findings. With its vibrant and innovative publication platform, Advanced Science seeks to revolutionize the dissemination and organization of scientific knowledge.