Diagnostic study of atmospheric pressure inductively coupled plasma temperature field based on image and relative spectral line method

IF 3.8 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY
Xingyue Jin , Peng Zhao , Lin Li , Chengzhou Liu , Chuanwen Geng , Qifu Lin , Liqun Hu
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引用次数: 0

Abstract

Atmospheric pressure inductively coupled plasma (ICP) is widely applied in the production of high-purity coatings and powders. This paper innovatively presents a dual-band imaging ICP temperature diagnostic system that integrates visible light image processing technology and relative spectral line method. The system utilizes a dual-band imaging unit to simultaneously acquire monochromatic grayscale images of ICP at two different wavelengths using a single CCD camera. By establishing the correspondence between the emission intensity received by the emission spectrometer and the grayscale images recorded by the CCD camera, the two-dimensional (2D) electron excitation temperature (EET) field distribution of ICP is obtained by the relative spectral line method. The experimental results demonstrate that the maximum EET is located near to the center line of the RF-driven coil. Additionally, the EET in ICP decreases gradually from the center of the induction coil to the periphery. As the radio frequency (RF) power increases, the maximum EET also increases, and the high-temperature region expands. The accuracy of this method is validated by comparing it with the results obtained from the Boltzmann plot method. Therefore, this method can quickly obtain the transient EET field distribution of ICP, which is significant for optimizing the application of ICP in material processing.
基于图像和相对谱线方法的大气压电感耦合等离子体温度场诊断研究
常压电感耦合等离子体(ICP)广泛应用于高纯涂层和粉末的生产。本文创新性地提出了一种双波段成像 ICP 温度诊断系统,该系统集成了可见光图像处理技术和相对谱线方法。该系统利用双波段成像装置,使用单个 CCD 相机同时获取两个不同波长的 ICP 单色灰度图像。通过建立发射光谱仪接收到的发射强度与 CCD 相机记录的灰度图像之间的对应关系,利用相对谱线法获得了 ICP 的二维(2D)电子激发温度(EET)场分布。实验结果表明,最大 EET 位于射频驱动线圈中心线附近。此外,ICP 中的 EET 从感应线圈中心向外围逐渐减小。随着射频(RF)功率的增加,最大 EET 也随之增加,高温区也随之扩大。通过与波尔兹曼图法得出的结果进行比较,验证了该方法的准确性。因此,该方法能快速获得 ICP 的瞬态 EET 场分布,这对优化 ICP 在材料加工中的应用意义重大。
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来源期刊
Vacuum
Vacuum 工程技术-材料科学:综合
CiteScore
6.80
自引率
17.50%
发文量
0
审稿时长
34 days
期刊介绍: Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.
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