A numerical study on effective arrangement of fan-filter units in a semiconductor cleanroom: Control of hazardous gas leakage from a process instrument

IF 7.1 1区工程技术 Q1 CONSTRUCTION & BUILDING TECHNOLOGY

Building and Environment Pub Date : 2024-11-23 DOI:10.1016/j.buildenv.2024.112301

Chengxi Yao , Seungjae Lee , Xiaojiang Wen , Jaewon Lee , Seokchan Lee , Seulgi Choi , Dongbin Huh , Taesung Kim

{"title":"A numerical study on effective arrangement of fan-filter units in a semiconductor cleanroom: Control of hazardous gas leakage from a process instrument","authors":"Chengxi Yao , Seungjae Lee , Xiaojiang Wen , Jaewon Lee , Seokchan Lee , Seulgi Choi , Dongbin Huh , Taesung Kim","doi":"10.1016/j.buildenv.2024.112301","DOIUrl":null,"url":null,"abstract":"<div><div>Contamination control in cleanrooms is essential for maintaining high productivity across various industries. In semiconductor manufacturing environments, hazardous gas leaks from instruments can pose serious health risks to operators, especially during the preventive maintenance. In this study, the numerical simulations were performed to evaluate and optimize the fan filter unit (FFU) arrangement in a cleanroom, aiming to effectively manage hazardous hydrogen chloride (HCl) gas leakage during semiconductor instrument maintenance. To reflect the actual situation, the study incorporates leakage conditions from a reference, considering various thermal factors. The simulation results indicate that the FFU arrangement and coverage rate, which influence internal airflow under a fixed air change rate (ACH), are critical for hazardous leakage control during preventive maintenance. A quantitative and comprehensive analysis of the accumulation of leaked gas on the operator and instrument surfaces showed that the analysis score proposed in this research on the horizontal FFU array with 30% coverage was 0.44, which is minimum among different cases, indicating the best performance on controlling dispersion behaviour of the hazardous gas in the cleanroom during the preventive maintenance.</div></div>","PeriodicalId":9273,"journal":{"name":"Building and Environment","volume":"267 ","pages":"Article 112301"},"PeriodicalIF":7.1000,"publicationDate":"2024-11-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Building and Environment","FirstCategoryId":"5","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0360132324011430","RegionNum":1,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"CONSTRUCTION & BUILDING TECHNOLOGY","Score":null,"Total":0}

引用次数: 0

Abstract

Contamination control in cleanrooms is essential for maintaining high productivity across various industries. In semiconductor manufacturing environments, hazardous gas leaks from instruments can pose serious health risks to operators, especially during the preventive maintenance. In this study, the numerical simulations were performed to evaluate and optimize the fan filter unit (FFU) arrangement in a cleanroom, aiming to effectively manage hazardous hydrogen chloride (HCl) gas leakage during semiconductor instrument maintenance. To reflect the actual situation, the study incorporates leakage conditions from a reference, considering various thermal factors. The simulation results indicate that the FFU arrangement and coverage rate, which influence internal airflow under a fixed air change rate (ACH), are critical for hazardous leakage control during preventive maintenance. A quantitative and comprehensive analysis of the accumulation of leaked gas on the operator and instrument surfaces showed that the analysis score proposed in this research on the horizontal FFU array with 30% coverage was 0.44, which is minimum among different cases, indicating the best performance on controlling dispersion behaviour of the hazardous gas in the cleanroom during the preventive maintenance.

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关于在半导体洁净室中有效布置风机过滤装置的数值研究：控制加工仪器的有害气体泄漏

洁净室的污染控制对于各行各业保持高生产率至关重要。在半导体制造环境中，仪器的有害气体泄漏会对操作人员的健康造成严重威胁，尤其是在预防性维护期间。本研究通过数值模拟来评估和优化洁净室中的风机过滤装置（FFU）布置，旨在有效管理半导体仪器维护期间的有害氯化氢（HCl）气体泄漏。为反映实际情况，该研究纳入了参照物的泄漏条件，并考虑了各种热因素。模拟结果表明，在固定换气率（ACH）条件下，影响内部气流的 FFU 布置和覆盖率对于预防性维护期间的有害泄漏控制至关重要。对操作人员和仪器表面的泄漏气体积聚情况进行的定量和综合分析表明，本研究提出的 30% 覆盖率水平 FFU 阵列的分析得分为 0.44，在不同情况下得分最低，表明在预防性维护期间控制洁净室内有害气体扩散行为的性能最佳。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Building and Environment 工程技术-工程：环境

CiteScore

12.50

自引率

23.00%

发文量

1130

审稿时长

27 days

期刊介绍： Building and Environment, an international journal, is dedicated to publishing original research papers, comprehensive review articles, editorials, and short communications in the fields of building science, urban physics, and human interaction with the indoor and outdoor built environment. The journal emphasizes innovative technologies and knowledge verified through measurement and analysis. It covers environmental performance across various spatial scales, from cities and communities to buildings and systems, fostering collaborative, multi-disciplinary research with broader significance.