Topochemical Fluorination of Epitaxial Thin Films of Barium-Doped Bismuth Iron Oxyfluoride

IF 3.2 2区 化学 Q2 CHEMISTRY, MULTIDISCIPLINARY
Mizuho Sano, Akiko Kamigaito, Yusuke Wakayama, Kei Shigematsu, Tsukasa Katayama, Yasushi Hirose and Akira Chikamatsu*, 
{"title":"Topochemical Fluorination of Epitaxial Thin Films of Barium-Doped Bismuth Iron Oxyfluoride","authors":"Mizuho Sano,&nbsp;Akiko Kamigaito,&nbsp;Yusuke Wakayama,&nbsp;Kei Shigematsu,&nbsp;Tsukasa Katayama,&nbsp;Yasushi Hirose and Akira Chikamatsu*,&nbsp;","doi":"10.1021/acs.cgd.4c0055210.1021/acs.cgd.4c00552","DOIUrl":null,"url":null,"abstract":"<p >Topochemical fluorination of epitaxial transition-metal oxide thin films is one of the superior methods for producing single-crystalline transition-metal oxyfluoride thin films with fascinating physical and chemical properties. In this study, we explore the topochemical fluorinations using polyvinylidene difluoride for epitaxial thin films of Ba-doped bismuth ferrite, a multiferroic related material, at different fluorination temperatures. Epitaxial thin films of perovskite-type bismuth iron oxyfluoride (Bi<sub>0.8</sub>Ba<sub>0.2</sub>FeO<sub>2.9–<i>x</i></sub>F<sub>2<i>x</i></sub>) were obtained with different F contents through fluorination at 200–300 °C. Increasing the fluorination temperature to 350 °C yielded an Aurivillius-type epitaxial film with partial iron oxide byproducts. Additionally, while BiFeO<sub>3</sub> has been proposed for various optical applications due to its visible optical bandgap (2.2–2.7 eV), we observed a further reduction in the bandgap upon fluorination: 2.0, 2.0, and 1.6 eV for the as-grown oxide, perovskite-type oxyfluoride, and Aurivillius-type oxyfluoride films with partial iron oxide byproducts, respectively. These findings demonstrate the significant influence of fluorination conditions on the crystal structure and electronic states of Ba-doped bismuth ferrite, offering a pathway for tailored tuning of its properties.</p>","PeriodicalId":34,"journal":{"name":"Crystal Growth & Design","volume":"24 22","pages":"9344–9349 9344–9349"},"PeriodicalIF":3.2000,"publicationDate":"2024-11-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Crystal Growth & Design","FirstCategoryId":"92","ListUrlMain":"https://pubs.acs.org/doi/10.1021/acs.cgd.4c00552","RegionNum":2,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"CHEMISTRY, MULTIDISCIPLINARY","Score":null,"Total":0}
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Abstract

Topochemical fluorination of epitaxial transition-metal oxide thin films is one of the superior methods for producing single-crystalline transition-metal oxyfluoride thin films with fascinating physical and chemical properties. In this study, we explore the topochemical fluorinations using polyvinylidene difluoride for epitaxial thin films of Ba-doped bismuth ferrite, a multiferroic related material, at different fluorination temperatures. Epitaxial thin films of perovskite-type bismuth iron oxyfluoride (Bi0.8Ba0.2FeO2.9–xF2x) were obtained with different F contents through fluorination at 200–300 °C. Increasing the fluorination temperature to 350 °C yielded an Aurivillius-type epitaxial film with partial iron oxide byproducts. Additionally, while BiFeO3 has been proposed for various optical applications due to its visible optical bandgap (2.2–2.7 eV), we observed a further reduction in the bandgap upon fluorination: 2.0, 2.0, and 1.6 eV for the as-grown oxide, perovskite-type oxyfluoride, and Aurivillius-type oxyfluoride films with partial iron oxide byproducts, respectively. These findings demonstrate the significant influence of fluorination conditions on the crystal structure and electronic states of Ba-doped bismuth ferrite, offering a pathway for tailored tuning of its properties.

Abstract Image

掺钡氟化铋铁外延薄膜的表观化学氟化反应
过渡金属氧化物外延薄膜的表层化学氟化是制备具有迷人物理和化学性质的单晶过渡金属氧氟化物薄膜的优越方法之一。在本研究中,我们探讨了在不同氟化温度下使用聚偏二氟乙烯对多铁性相关材料掺杂铋铁氧体的外延薄膜进行拓扑化学氟化的方法。通过在 200-300 ℃ 下进行氟化,获得了不同 F 含量的包晶型氧氟化铋铁(Bi0.8Ba0.2FeO2.9-xF2x)外延薄膜。将氟化温度升高到 350 ℃,可获得带有部分氧化铁副产物的奥里维利乌斯型外延薄膜。此外,虽然 BiFeO3 因其可见光带隙(2.2-2.7 eV)而被建议用于各种光学应用,但我们观察到氟化后带隙进一步减小:生长的氧化物、过氧化物型氧氟化物和带有部分氧化铁副产物的 Aurivillius 型氧氟化物薄膜的带隙分别为 2.0、2.0 和 1.6 eV。这些研究结果表明,氟化条件对掺钡铁铋的晶体结构和电子态有重大影响,为定制调整其特性提供了途径。
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来源期刊
Crystal Growth & Design
Crystal Growth & Design 化学-材料科学:综合
CiteScore
6.30
自引率
10.50%
发文量
650
审稿时长
1.9 months
期刊介绍: The aim of Crystal Growth & Design is to stimulate crossfertilization of knowledge among scientists and engineers working in the fields of crystal growth, crystal engineering, and the industrial application of crystalline materials. Crystal Growth & Design publishes theoretical and experimental studies of the physical, chemical, and biological phenomena and processes related to the design, growth, and application of crystalline materials. Synergistic approaches originating from different disciplines and technologies and integrating the fields of crystal growth, crystal engineering, intermolecular interactions, and industrial application are encouraged.
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