Enhanced Dielectric Performance of Polypropylene Film by Surfacing Grafting and Crosslinking for Metalized Film Capacitors

IF 1.7 3区 物理与天体物理 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC
Meng Xiao;Zhiyuan Zhang;Boxue Du;Bin Wang;Jianmei Cao
{"title":"Enhanced Dielectric Performance of Polypropylene Film by Surfacing Grafting and Crosslinking for Metalized Film Capacitors","authors":"Meng Xiao;Zhiyuan Zhang;Boxue Du;Bin Wang;Jianmei Cao","doi":"10.1109/TASC.2024.3484329","DOIUrl":null,"url":null,"abstract":"In this paper, the surface grafting and crosslinking modification method is proposed for enhancing the dielectric properties of polypropylene (PP) films for metalized film capacitors (MFCs). The results indicate that the leakage conductivity of the modified film is 1.05 × 10\n<sup>−16</sup>\n S/m, exhibiting better resistance characteristics. The DC breakdown strength could reach 625.2 kV/mm, marking a notable 14.8% increase compared to the pure PP film. The surface grafting could lead to charge concentration at the electrode/film interface, which weakens the interfacial electric field and inhibits charge injection. Furthermore, the crosslinking reaction could enhance the entanglement of macromolecular chains, thereby changing the crystal morphology of PP and decreasing the migration rate of carriers. This method improves the dielectric properties of the capacitor film from the perspective of charge transport.","PeriodicalId":13104,"journal":{"name":"IEEE Transactions on Applied Superconductivity","volume":"34 8","pages":"1-4"},"PeriodicalIF":1.7000,"publicationDate":"2024-10-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Transactions on Applied Superconductivity","FirstCategoryId":"101","ListUrlMain":"https://ieeexplore.ieee.org/document/10723796/","RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0

Abstract

In this paper, the surface grafting and crosslinking modification method is proposed for enhancing the dielectric properties of polypropylene (PP) films for metalized film capacitors (MFCs). The results indicate that the leakage conductivity of the modified film is 1.05 × 10 −16 S/m, exhibiting better resistance characteristics. The DC breakdown strength could reach 625.2 kV/mm, marking a notable 14.8% increase compared to the pure PP film. The surface grafting could lead to charge concentration at the electrode/film interface, which weakens the interfacial electric field and inhibits charge injection. Furthermore, the crosslinking reaction could enhance the entanglement of macromolecular chains, thereby changing the crystal morphology of PP and decreasing the migration rate of carriers. This method improves the dielectric properties of the capacitor film from the perspective of charge transport.
通过表面接枝和交联增强聚丙烯薄膜的介电性能,用于金属化薄膜电容器
本文提出了表面接枝和交联改性方法,用于提高金属化薄膜电容器(MFC)用聚丙烯(PP)薄膜的介电性能。结果表明,改性薄膜的漏电电导率为 1.05 × 10-16 S/m,表现出更好的电阻特性。直流击穿强度可达 625.2 kV/mm,与纯 PP 薄膜相比显著提高了 14.8%。表面接枝会导致电荷集中在电极/薄膜界面,从而削弱界面电场,抑制电荷注入。此外,交联反应可增强大分子链的缠结,从而改变 PP 的晶体形态,降低载流子的迁移率。这种方法从电荷传输的角度改善了电容器薄膜的介电性能。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
IEEE Transactions on Applied Superconductivity
IEEE Transactions on Applied Superconductivity 工程技术-工程:电子与电气
CiteScore
3.50
自引率
33.30%
发文量
650
审稿时长
2.3 months
期刊介绍: IEEE Transactions on Applied Superconductivity (TAS) contains articles on the applications of superconductivity and other relevant technology. Electronic applications include analog and digital circuits employing thin films and active devices such as Josephson junctions. Large scale applications include magnets for power applications such as motors and generators, for magnetic resonance, for accelerators, and cable applications such as power transmission.
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